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公开(公告)号:US20240088157A1
公开(公告)日:2024-03-14
申请号:US17942233
申请日:2022-09-12
Applicant: GlobalFoundries U.S. Inc.
Inventor: Michel Abou-Khalil , Steven M. Shank , Sarah McTaggart , Aaron Vallett , Rajendran Krishnasamy , Megan Lydon-Nuhfer
IPC: H01L27/12 , H01L21/762 , H01L21/84
CPC classification number: H01L27/1203 , H01L21/76286 , H01L21/84
Abstract: Semiconductor device structures with device isolation and methods of forming a semiconductor device structure with device isolation. The structure comprises a semiconductor substrate, a first semiconductor layer on the semiconductor substrate, a second semiconductor layer in a cavity in the first semiconductor layer, and a device structure including a doped region in the second semiconductor layer. The first semiconductor layer comprises a porous semiconductor material, and the second semiconductor layer comprises a single-crystal semiconductor material.
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公开(公告)号:US20240178290A1
公开(公告)日:2024-05-30
申请号:US18059186
申请日:2022-11-28
Applicant: GlobalFoundries U.S. Inc.
Inventor: Megan Lydon-Nuhfer , Steven M. Shank , Aaron L. Vallett , Michel Abou-Khalil , Sarah A. McTaggart , Rajendran Krishnasamy
CPC classification number: H01L29/42376 , H01L29/0657 , H01L29/0847 , H01L29/401 , H01L29/42356 , H01L29/4916 , H01L29/6653
Abstract: An integrated circuit (IC) structure includes a V-shaped cavity in a semiconductor substrate. A source region and a drain region are on opposing sides of the V-shaped cavity. A gate structure includes a gate dielectric layer, spacers, and a gate electrode on the gate dielectric layer between the spacers. The gate structure is fully within the V-shaped cavity. The IC structure provides a switch that finds advantageous application as part of a low noise amplifier. The IC structure provides a smaller gate width, decreased capacitance, increased gain and increased radio frequency (RF) performance compared to planar devices or devices without the gate structure fully within V-shaped cavity.
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