Invention Publication
- Patent Title: SUBSTRATE LIQUID-TREATMENT DEVICE
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Application No.: US18552108Application Date: 2022-03-22
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Publication No.: US20240192111A1Publication Date: 2024-06-13
- Inventor: Hiroshi MARUMOTO , Suguen LEE , Masashi ENOMOTO
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Minato-ku, Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-ku, Tokyo
- Priority: JP 21063140 2021.04.01
- International Application: PCT/JP2022/013307 2022.03.22
- Date entered country: 2023-09-22
- Main IPC: G01N15/075
- IPC: G01N15/075 ; G01N15/00 ; H01L21/67

Abstract:
A substrate liquid-processing apparatus includes: a processing tank storing a processing liquid for liquid-processing of a substrate within an inside; an imager configured to acquire an image of the processing liquid of the inside of the processing tank; and an image processor comprising a bubble data acquisitor configured to perform image processing on the image and to acquire bubble data representing the state of bubbles in the processing liquid.
Information query