Invention Publication
- Patent Title: APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
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Application No.: US18333185Application Date: 2023-06-12
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Publication No.: US20240192602A1Publication Date: 2024-06-13
- Inventor: Min Jung PARK , Soo Bin YONG , Jae Hoon PARK
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Priority: KR 20220172461 2022.12.12
- Main IPC: G03F7/16
- IPC: G03F7/16 ; G03F1/56 ; H01L21/02 ; H01L21/47 ; H01L21/67
Abstract:
The inventive concept provides a substrate treating method. The substrate treating apparatus includes first treating including supplying a first liquid to a rotating substrate; and second treating including supplying a second liquid to the rotating substrate after the supplying of the first liquid, and wherein a rotation speed of a substrate is changed during the supplying of the first liquid to the rotating substrate.
Information query
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