公开(公告)号：US20240219838A1

公开(公告)日：2024-07-04

申请号：US18341828

申请日：2023-06-27

Applicant: SEMES CO., LTD.

Inventor： Soo Bin YONG ,  Min Jung PARK

IPC: G03F7/16

CPC classification number: G03F7/162 ,  G03F7/168

Abstract: The inventive concept provides a substrate treating method. The substrate treating apparatus includes supplying a first liquid to a rotating substrate to treat a substrate; and supplying a second liquid which is different from the first liquid to the rotating substrate to coat the substrate with the second liquid, and wherein a rotation direction of the substrate is different at the supplying the first liquid and at the supplying the second liquid.

公开(公告)号：US20240192602A1

公开(公告)日：2024-06-13

申请号：US18333185

申请日：2023-06-12

Applicant: SEMES CO., LTD.

Inventor： Min Jung PARK ,  Soo Bin YONG ,  Jae Hoon PARK

IPC: G03F7/16 ,  G03F1/56 ,  H01L21/02 ,  H01L21/47 ,  H01L21/67

CPC classification number: G03F7/162 ,  G03F1/56 ,  H01L21/02282 ,  H01L21/47 ,  H01L21/67034

Abstract: The inventive concept provides a substrate treating method. The substrate treating apparatus includes first treating including supplying a first liquid to a rotating substrate; and second treating including supplying a second liquid to the rotating substrate after the supplying of the first liquid, and wherein a rotation speed of a substrate is changed during the supplying of the first liquid to the rotating substrate.