Invention Publication
- Patent Title: COUPLING A LAYER OF SILICON CARBIDE WITH AN ADJACENT LAYER
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Application No.: US18089936Application Date: 2022-12-28
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Publication No.: US20240222435A1Publication Date: 2024-07-04
- Inventor: Abhishek Anil SHARMA , Han Wui THEN , Wilfred GOMES , Anand S. MURTHY , Tahir GHANI , Sagar SUTHRAM , Pushkar RANADE
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L21/02 ; H01L27/105

Abstract:
Embodiments described herein may be related to apparatuses, processes, systems, and/or techniques for fabricating semiconductor packages that use a SiC layer that is coupled with another layer that includes another material. The SiC layer may be an active layer that includes devices, such as transistors, that are coupled with devices that may be in the other layer. The SiC layer may be coupled with the other layer using fusion bonding, hybrid bonding, layer transfer, and/or bump and island formation techniques. Other embodiments may be described and/or claimed.
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