发明公开
- 专利标题: DISPLAY DEVICE
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申请号: US18640136申请日: 2024-04-19
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公开(公告)号: US20240266359A1公开(公告)日: 2024-08-08
- 发明人: Atsushi UMEZAKI
- 申请人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 申请人地址: JP Atsugi-shi
- 专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人地址: JP Atsugi-shi
- 优先权: JP 06269689 2006.09.29
- 分案原申请号: US13117658 2011.05.27
- 主分类号: H01L27/12
- IPC分类号: H01L27/12 ; G02F1/1333 ; G02F1/1343 ; G02F1/1345 ; G02F1/1362 ; G02F1/1368 ; G09G3/3266 ; G09G3/36 ; G11C19/28 ; H01H71/02 ; H01H71/10 ; H01L27/105 ; H01L27/13 ; H01L29/423 ; H01L29/786 ; H10K59/121 ; H10K59/131
摘要:
By applying an AC pulse to a gate of a transistor which easily deteriorates, a shift in threshold voltage of the transistor is suppressed. However, in a case where amorphous silicon is used for a semiconductor layer of a transistor, the occurrence of a shift in threshold voltage naturally becomes a problem for a transistor which constitutes a part of circuit that generates an AC pulse. A shift in threshold voltage of a transistor which easily deteriorates and a shift in threshold voltage of a turned-on transistor are suppressed by signal input to a gate electrode of the transistor which easily deteriorates through the turned-on transistor. In other words, a structure for applying an AC pulse to a gate electrode of a transistor which easily deteriorates through a transistor to a gate electrode of which a high potential (VDD) is applied, is included.
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