- 专利标题: Nonvolatile Memory Device Including Dual Memory Layers
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申请号: US18106159申请日: 2023-02-06
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公开(公告)号: US20240268125A1公开(公告)日: 2024-08-08
- 发明人: Zhiqiang Wei , Zihui Wang , Ebrahim Abedifard , Yiming Huai
- 申请人: Avalanche Technology, Inc.
- 申请人地址: US CA Fremont
- 专利权人: Avalanche Technology, Inc.
- 当前专利权人: Avalanche Technology, Inc.
- 当前专利权人地址: US CA Fremont
- 主分类号: H10B61/00
- IPC分类号: H10B61/00 ; H01L23/528 ; H10N50/10
摘要:
The present invention is directed to a nonvolatile memory device including a plurality of first conductive lines extending along a first direction; first and second plurality of second conductive lines extending along a second direction; an array of active regions, each active region having an elongated shape directed along a third direction substantially bisecting an angle formed between the first and second directions and including first and second drains formed at opposite ends thereof; and an array of first memory elements and an array of second memory elements formed at different levels, each first memory element and each second memory element being electrically connected to a respective first drain and a respective second drain, respectively. The first and second plurality of second conductive lines are electrically connected to the array of first memory elements and the array of second memory elements along the second direction, respectively.
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