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US4314874A Method for forming a fine pattern of an aluminum film 失效
形成铝膜精细图案的方法

Method for forming a fine pattern of an aluminum film
摘要:
A thin aluminum film 3 is formed on the top surface of a substrate 2, 1. Selected areas of the aluminum film are irradiated by an oxygen ion beam 6 to form implanted regions 7. The surface is then plasma etched, with the oxygen ion implanted regions serving as a mask to thereby prevent the removal of the underlying areas of the aluminum film.
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