发明授权
- 专利标题： Method and apparatus for plasma process
- 专利标题（中）： 等离子体工艺的方法和装置
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申请号： US636997申请日： 1984-08-02
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公开(公告)号： US4563240A公开(公告)日： 1986-01-07
- 发明人: Fumio Shibata , Katsuaki Nagatomo , Hidetomo Fukuhara , Gen Marumoto , Sadayuki Okudaira
- 申请人： Fumio Shibata , Katsuaki Nagatomo , Hidetomo Fukuhara , Gen Marumoto , Sadayuki Okudaira
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX58-144941 19830810
- 主分类号： H01L21/302
- IPC分类号： H01L21/302 ; H01J37/32 ; H01L21/3065 ; H01L21/3213 ; B44C1/22 ; C03C15/00 ; C03C25/06 ; C23F1/02
摘要：
The invention relates to a method and apparatus for a plasma process in which identical samples are processed in a plasma-processing apparatus provided with a radio-frequency plasma generation means and a microwave plasma generation means, by the utilization of a radio-frequency plasma in the radio-frequency plasma generation means and a microwave plasma in the microwave plasma generation means. The plasma-processing rate can thus be increased, and also electrical damage due to ions in the plasma can be reduced, thereby ensuring a high throughput and a high quality during the manufacture of semiconductor integrated circuit elements.
公开/授权文献
- USD338067S Combined foot and leg splint 公开/授权日：1993-08-03
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