发明授权
- 专利标题： Direct-heated gas-flow measuring apparatus
- 专利标题（中）： 直热式气流测量仪
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申请号： US729855申请日： 1985-05-02
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公开(公告)号： US4627279A公开(公告)日： 1986-12-09
- 发明人: Minoru Ohta , Kazuhiko Miura , Seizi Huzino , Kenji Kanehara , Tadashi Hattori
- 申请人： Minoru Ohta , Kazuhiko Miura , Seizi Huzino , Kenji Kanehara , Tadashi Hattori
- 申请人地址： JPX Nishio
- 专利权人： Nippon Soken, Inc.
- 当前专利权人： Nippon Soken, Inc.
- 当前专利权人地址： JPX Nishio
- 优先权： JPX59-91042 19840509
- 主分类号： G01F1/68
- IPC分类号： G01F1/68 ; G01F1/00 ; G01F1/684 ; G01F1/692 ; G01F1/696 ; G01F1/698
摘要：
A direct-heated gas-flow measuring apparatus for a passage including a plurality of film resistors, disposed within the passage, for generating heat and measuring the temperature thereof, and a feedback control circuit for controlling the heat generated by the film resistors so that the temperature of each of the film resistors is a predetermined value. The feedback control circuit generates a plurality of output signals corresponding to voltages applied to the film resistors. A mean value for the plurality of output signals is calculated as the amount of gas-flow rate.
公开/授权文献
- US6114254A Method for removing contaminants from a semiconductor wafer 公开/授权日：2000-09-05
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