发明授权
US4705740A Radiation-polymerizable mixture, copolymer contained therein, and a
process for the preparation of the copolymer
失效
可辐射聚合的混合物,其中所含的共聚物和共聚物的制备方法
- 专利标题: Radiation-polymerizable mixture, copolymer contained therein, and a process for the preparation of the copolymer
- 专利标题(中): 可辐射聚合的混合物,其中所含的共聚物和共聚物的制备方法
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申请号: US753945申请日: 1985-07-11
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公开(公告)号: US4705740A公开(公告)日: 1987-11-10
- 发明人: Ulrich Geissler , Klaus Albrecht
- 申请人: Ulrich Geissler , Klaus Albrecht
- 申请人地址: DEX
- 专利权人: Hoechst Aktiengesellschaft
- 当前专利权人: Hoechst Aktiengesellschaft
- 当前专利权人地址: DEX
- 优先权: DEX3427519 19840726
- 主分类号: C08F220/00
- IPC分类号: C08F220/00 ; C08F2/02 ; C08F2/50 ; C08F2/54 ; C08F220/04 ; C08F220/10 ; C08F220/18 ; C08F265/04 ; C08L57/04 ; G03F7/033 ; G03C1/68 ; C08F20/06
摘要:
A layer comprised of a radiation-polymerizable mixture containing (a) a first compound capable of undergoing free radical polymerization, the first compound containing at least two terminal ethylenically unsaturated groups and having a boiling point above 100.degree. C. under atmospheric pressure, (b) a second compound capable of initiating the polymerization of the first compound when exposed to actinic radiation, and (c) a water-insoluble copolymer which is soluble in aqueous alkaline solutions and which comprises (c1) an .alpha..beta.-unsaturated aliphatic carboxylic acid and (c2) an alkyl methacrylate having at least 4 carbon atoms in the alkyl group, wherein the copolymer has a mean molecular weight in the range from about 50,000 to 200,000 possesses high flexiblity and resilience in both unexposed and exposed states. The mixture is particularly suitable for use as dry resist material for the tenting technique in printed circuit board production.
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