发明授权
- 专利标题: Chamber plate for use in cell fusion and a process for production thereof
- 专利标题(中): 用于细胞融合的腔室板及其制造方法
-
申请号: US122269申请日: 1987-11-18
-
公开(公告)号: US4894343A公开(公告)日: 1990-01-16
- 发明人: Shinji Tanaka , Kazuo Sato , Tsuneo Terasawa , Yoshio Kawamura , Hisashi Tsuruoka
- 申请人: Shinji Tanaka , Kazuo Sato , Tsuneo Terasawa , Yoshio Kawamura , Hisashi Tsuruoka
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX61-274031 19861119
- 主分类号: C12M1/00
- IPC分类号: C12M1/00 ; C12M1/32 ; C12M1/34 ; C12M3/00 ; C12N13/00 ; G01N15/14
摘要:
There are disclosed a chamber plate for use in cell fusion comprising a plate of single crystal silicon on which a plurality of chambers for holding at least a pair of unit cells are formed in array, said chamber having at the bottom a plate having slits which do not pass cells to be held; and a process for producing a chamber plate for use in cell fusion which comprises forming chambers for holding cells in a plate of single crystal silicon by anisotropic etching or isotropic etching by chemical etching.
公开/授权文献
- US06135886A Variable-conductance sensor with elastomeric dome-cap 公开/授权日:2000-10-24
信息查询