发明授权
- 专利标题： Microlithographic process for producing circuits using conductive organic films sensitive to electromagnetic radiation and to charged particles, as well as to the circuits and components obtained by this process
- 专利标题（中）： 使用对电磁辐射敏感的导电有机膜和带电粒子的电路的微光刻工艺，以及通过该方法获得的电路和部件
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申请号： US172597申请日： 1988-03-24
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公开(公告)号： US4925774A公开(公告)日： 1990-05-15
- 发明人: Andre Barraud , Joel Richard , Michel Vandevyver
- 申请人： Andre Barraud , Joel Richard , Michel Vandevyver
- 申请人地址： FRX Paris
- 专利权人： Commissariat a l'Energie Atomique
- 当前专利权人： Commissariat a l'Energie Atomique
- 当前专利权人地址： FRX Paris
- 优先权： FRX8704075 19870324
- 主分类号： H01B5/14
- IPC分类号： H01B5/14 ; H01B13/00 ; H05K1/09 ; H05K3/00 ; H05K3/02 ; H05K3/10
摘要：
The invention relates to a microlithographic process for producing circuits using organic, conductive films sensitive to electromagnetic radiation and to charged particles.This process for producing electricity conducting zones on a substrate consists of depositing on said substrate a coating of an electricity conducting, organic compound, such as alkyl pyridinium-tetracyanoquinodimethane and then irradiating certain locations (2,3) of the coating by means of charged particles and/or electromagnetic radiation, so that the irradiated locations become insulating and that on the organic compound coating the electricity conducting zones (1) are directly formed at the desired locations.
公开/授权文献
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