发明授权
- 专利标题: Method of making a semiconductor device
- 专利标题(中): 制造半导体器件的方法
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申请号: US285389申请日: 1988-12-16
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公开(公告)号: US4935375A公开(公告)日: 1990-06-19
- 发明人: Erich Kasper , Klaus Worner
- 申请人: Erich Kasper , Klaus Worner
- 申请人地址: DEX Frankfurt am Main
- 专利权人: Licentia Patent-Verwaltungs-GmbH
- 当前专利权人: Licentia Patent-Verwaltungs-GmbH
- 当前专利权人地址: DEX Frankfurt am Main
- 优先权: DEX3545244 19851220
- 主分类号: H01L21/203
- IPC分类号: H01L21/203 ; H01L21/331 ; H01L21/763 ; H01L29/08 ; H01L29/732
摘要:
A structured semiconductor body based on a Si substrate and having monocrystalline semiconductor regions and barrier regions which contain polycrystalline silicon which have preferably been produced in an Si-MBE process. The barrier regions are provided to delimit the monocrystalline Si semiconductor structures to prevent undesired current flow, for example between two monocrystalline devices of an integrated circuit. The polycrystalline silicon of the barrier regions has a substantially lower electrical conductivity than the monocrystalline regions, and consequently it is possible to spatially selectively dope portions the barrier region so as to provide regions which electrically contact a monocrystalline silicon region. In a preferred embodiment a polycrystalline silicon region within the barrier region is doped so that it forms a pn-junction with the adjacent monocrystalline semiconductor region and can be used, for example, as an emitter zone of a bipolar device.
公开/授权文献
- US5443618A Earth melter 公开/授权日:1995-08-22
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