发明授权
- 专利标题: GaAs/AlGaAs heterostructure laser containing indium
- 专利标题(中): 包含铟的GaAs / AlGaAs异质结构激光
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申请号: US408675申请日: 1989-09-18
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公开(公告)号: US4984242A公开(公告)日: 1991-01-08
- 发明人: Donald R. Scifres , David F. Welch , John Endriz , William Streifer
- 申请人: Donald R. Scifres , David F. Welch , John Endriz , William Streifer
- 申请人地址: CA San Jose
- 专利权人: Spectra Diode Laboratories, Inc.
- 当前专利权人: Spectra Diode Laboratories, Inc.
- 当前专利权人地址: CA San Jose
- 主分类号: H01S5/00
- IPC分类号: H01S5/00 ; H01S5/30 ; H01S5/32 ; H01S5/323 ; H01S5/34 ; H01S5/343
摘要:
GaAs/AlGaAs heterostructure lasers containing indium in at least one layer other than or in addition to the active region. Embodiments are described in which indium added in low concentration to the cladding functions to match the lattice constants between the cladding and active layers, in which indium is added in high concentration to form strain layers that prevent defect migration therethrough and if proximate to the active region decrease transparency current and increase differential gain, in which indium is added uniformly to all layers to suppress defect formation, and in which indium is added to a cap layer to reduce metallization contact resistance.
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