Invention Grant
US5215857A 1,2-quinonediazide containing radiation-sensitive resin composition
utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or
methyl 3-methoxypropionate as the solvent
失效
含有2-羟基丙酸甲酯，2-羟基丙酸乙酯或3-甲氧基丙酸甲酯作为溶剂的含有辐射敏感性树脂组合物的1,2-醌二叠氮化物
- Patent Title: 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent
- Patent Title (中): 含有2-羟基丙酸甲酯，2-羟基丙酸乙酯或3-甲氧基丙酸甲酯作为溶剂的含有辐射敏感性树脂组合物的1,2-醌二叠氮化物
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Application No.: US726140Application Date: 1991-07-03
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Publication No.: US5215857APublication Date: 1993-06-01
- Inventor: Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
- Applicant: Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
- Applicant Address: JPX Tokyo
- Assignee: Japan Synthetic Rubber Co., Ltd.
- Current Assignee: Japan Synthetic Rubber Co., Ltd.
- Current Assignee Address: JPX Tokyo
- Priority: JPX60-173396 19850807
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/008 ; G03F7/022
Abstract:
A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
Public/Granted literature
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