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    Positive type radiation-sensitive resin composition
    4.
    发明授权
    Positive type radiation-sensitive resin composition 失效
    阳离子型辐射敏感性树脂组合物

    公开(公告)号：US5087548A

    公开(公告)日：1992-02-11

    申请号：US282958

    申请日：1988-12-05

    申请人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita ,  Kiyoshi Honda

    发明人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita ,  Kiyoshi Honda

    IPC分类号： G03F7/023

    CPC分类号： G03F7/0236

    摘要： A positive type radiation-sensitive resin composition which comprises a 1,2-quinonediazide compound and an alkali-soluble novolac resin produced by poly-condensing phenols represented by the formulas (I) and (II) in a molar ratio of (I)/(II) of 1/99 to 100/0 with a carbonyl compound: ##STR1## wherein R.sup.1 and R.sup.2, which may be the same or different, represent hydroxyl groups, hydrogen atoms, alkyl groups, aryl groups, aralkyl groups, alkenyl groups, halogen atoms, alkoxy groups, alkoxycarbonyl groups, aroxycarbonyl groups, alkanoyloxy groups, aroyloxy groups, acyl groups, cyano groups or nitro groups, ##STR2## wherein R.sup.3, R.sup.4 and R.sup.5, which may be the same or different, represent hydrogen atoms, alkyl groups, aryl groups, aralkyl groups, alkenyl groups, halogen atoms, alkoxy groups, alkoxycarbonyl groups, aroxycarbonyl groups, alkanoyloxy groups, aroyloxy groups, acyl groups, cyano groups or nitro groups. The above positive type radiation-sensitive resin composition is excellent in dry-etching resistance, resolution and heat resistance, and appropriate as a positive type resist for producing integrated circuits in which a resist pattern is formed, and also as a positive type resist for producing a mask.

    摘要翻译： 一种阳离子型辐射敏感性树脂组合物，其包含1,2-醌二叠氮化合物和由式（I）和（II）表示的聚缩醛的酚缩合树脂，摩尔比为（I）/ （II），其中羰基化合物：其中R 1和R 2可以相同或不同，表示羟基，氢原子，烷基，芳基，芳烷基 ，烯基，卤素原子，烷氧基，烷氧基羰基，芳氧基羰基，烷酰氧基，芳氧基，酰基，氰基或硝基，其中R3，R4和R5可以相同， 不同的，表示氢原子，烷基，芳基，芳烷基，烯基，卤素原子，烷氧基，烷氧基羰基，芳氧基羰基，烷酰氧基，芳氧基，酰基，氰基或硝基。 上述正型辐射敏感性树脂组合物的耐干蚀刻性，分辨率和耐热性优异，并且适合作为用于制造其中形成抗蚀剂图案的集成电路的正型抗蚀剂，并且作为用于生产抗蚀剂图案的正型抗蚀剂 一个面具

    Radiation-sensitive resin composition
    5.
    发明授权
    Radiation-sensitive resin composition 失效
    辐射敏感树脂组合物

    公开(公告)号：US06270939B1

    公开(公告)日：2001-08-07

    申请号：US09638955

    申请日：2000-08-16

    申请人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita

    发明人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita

    IPC分类号： G03F7023

    CPC分类号： G03F7/0226 ,  G03F7/0048 ,  G03F7/0085

    摘要： A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含碱溶性树脂和辐射敏感性化合物在包含单一单羧酸酯的溶剂中的溶液。 该组合物具有高的储存稳定性（即，在储存期间形成非常少量的微粒），并且适合用作制造集成电路的抗蚀剂。

    Radiation-sensitive resin composition
    7.
    发明授权
    Radiation-sensitive resin composition 失效
    辐射敏感树脂组合物

    公开(公告)号：US06228554B1

    公开(公告)日：2001-05-08

    申请号：US09414724

    申请日：1999-10-08

    申请人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita

    发明人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita

    IPC分类号： G03F7023

    CPC分类号： G03F7/0226 ,  G03F7/0048 ,  G03F7/0085

    摘要： A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymono-carboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含碱溶性树脂和辐射敏感性化合物在包含单一单羧酸酯的溶剂中的溶液。 该组合物具有高的储存稳定性（即，在储存期间形成非常少量的微粒），并且适合用作制造集成电路的抗蚀剂。

    Process for forming patterns using ionizing radiation sensitive resist
    10.
    发明授权
    Process for forming patterns using ionizing radiation sensitive resist 失效
    使用电离辐射敏感抗蚀剂形成图案的工艺

    公开(公告)号：US4623609A

    公开(公告)日：1986-11-18

    申请号：US735715

    申请日：1985-05-20

    申请人： Yoshiyuki Harita ,  Yoichi Kamoshida ,  Masashige Takatori ,  Kunihiro Harada

    发明人： Yoshiyuki Harita ,  Yoichi Kamoshida ,  Masashige Takatori ,  Kunihiro Harada

    IPC分类号： C08F8/20 ,  G03F7/038 ,  G03C5/00

    CPC分类号： G03F7/038 ,  C08F8/20

    摘要： An ionizing radiation sensitive resist consisting essentially of a polymer having a recurring unit represented by the following formula: ##STR1## wherein X is a hydrogen atom, a methyl group, or a halogen atom and R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5, which may be identical or different, are hydrogen atoms, halogen atoms, alkyl groups having 1 to 3 carbon atoms, alkoxy groups having 1 to 3 carbon atoms, haloalkyl groups having 1 to 3 carbon atoms or haloalkoxy groups having 1 to 3 carbon atoms, at least a part of the X groups present in said polymer being a halogen atom, at least a part of the Y.sup.1 and Y.sup.2 group present in said polymer being a halogen atom, and at least a part of the R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 groups present in said polymer being a haloalkyl or haloalkoxy group having 1 to 3 carbon atoms. Said ionizing radiation sensitive resist is suitable as a negative type resist. This resist is used in the form of an organic solvent solution to form a coating film on a substrate and the desired parts of this coating film are irradiated with an ionizing radiation, whereby patterns are formed.

    摘要翻译： 基本上由具有由下式表示的重复单元的聚合物组成的电离辐射敏感抗蚀剂：其中X是氢原子，甲基或卤素原子，R1，R2，R3，R4和R5，其中 可以相同或不同，是氢原子，卤素原子，具有1至3个碳原子的烷基，具有1至3个碳原子的烷氧基，具有1至3个碳原子的卤代烷基或具有1至3个碳原子的卤代烷氧基，在 所述聚合物中存在的X基团的至少一部分为卤素原子，所述聚合物中存在的Y1和Y2基团的至少一部分为卤素原子，R 1，R 2，R 3，R 4和 所述聚合物中存在的R 5基团是具有1至3个碳原子的卤代烷基或卤代烷氧基。 所述电离辐射敏感抗蚀剂适合作为负型抗蚀剂。 该抗蚀剂以有机溶剂溶液的形式使用，以在基材上形成涂膜，用电离辐射照射该涂膜的所需部分，形成图案。