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    Radiation-sensitive resin composition
    1.
    发明授权
    Radiation-sensitive resin composition 失效
    辐射敏感树脂组合物

    公开(公告)号：US5478691A

    公开(公告)日：1995-12-26

    申请号：US259167

    申请日：1994-06-13

    申请人： Satoshi Miyashita ,  Akihiro Yamanouchi ,  Ikuo Nozue ,  Takao Miura

    发明人： Satoshi Miyashita ,  Akihiro Yamanouchi ,  Ikuo Nozue ,  Takao Miura

    IPC分类号： C08G8/08 ,  G03F7/023 ,  G03F7/30

    CPC分类号： C08G8/08 ,  G03F7/0236

    摘要： A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alakli-soluble novolak resin comprises a mixture of:95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 2,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I'): ##STR1## wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol repreented by the above structural formula (I) or (I') with at least one aldehyde] and5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II): ##STR2## wherein n is 0, 1, 2 or 3, with at least one aldehyde]. In the resin composition, the mixture of Resin A and Resin B may further contain Resin C which is an ester of Resin B with a 1,2-quinonediazidesulfonic acid. The radiation-sensitive resin compopsition is suitable for use as a positive type resist having high sensitivity, excellent developability, high resolution and excellent heat resistance.

    摘要翻译： 一种包含碱溶性酚醛清漆树脂和1,2-醌二叠氮化合物的辐射敏感性树脂组合物，其中所述可溶解酚醛清漆树脂包括：95-50重量份具有标准聚苯乙烯缩小重量的树脂A - 平均分子量为2,000-20,000 [树脂A为选自由间甲酚和至少一种由结构式（I）或（I'）表示的苯酚缩聚得到的树脂中的至少一种树脂： 其中m为2或3，与至少一种醛和通过间甲酚，对甲酚和至少一种由上述结构所代表的苯酚缩聚获得的树脂 式（I）或（I'）与至少一种醛]和5-50重量份具有标准聚苯乙烯换算的重均分子量为200-2,000的树脂B [树脂B是通过缩聚 至少一种由结构式（II）表示的苯酚：其中， s 0,1,2或3与至少一个醛]。 在树脂组合物中，树脂A和树脂B的混合物可以进一步含有作为树脂B与1,2-醌二叠氮磺酸的酯的树脂C. 辐射敏感性树脂组合物适用于具有高灵敏度，显影性，高分辨率和优异耐热性的正型抗蚀剂。

    Radiation-sensitive resin composition
    4.
    发明授权
    Radiation-sensitive resin composition 失效
    辐射敏感树脂组合物

    公开(公告)号：US06270939B1

    公开(公告)日：2001-08-07

    申请号：US09638955

    申请日：2000-08-16

    申请人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita

    发明人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita

    IPC分类号： G03F7023

    CPC分类号： G03F7/0226 ,  G03F7/0048 ,  G03F7/0085

    摘要： A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含碱溶性树脂和辐射敏感性化合物在包含单一单羧酸酯的溶剂中的溶液。 该组合物具有高的储存稳定性（即，在储存期间形成非常少量的微粒），并且适合用作制造集成电路的抗蚀剂。

    Positive type radiation-sensitive resin composition
    7.
    发明授权
    Positive type radiation-sensitive resin composition 失效
    阳离子型辐射敏感性树脂组合物

    公开(公告)号：US5087548A

    公开(公告)日：1992-02-11

    申请号：US282958

    申请日：1988-12-05

    申请人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita ,  Kiyoshi Honda

    发明人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita ,  Kiyoshi Honda

    IPC分类号： G03F7/023

    CPC分类号： G03F7/0236

    摘要： A positive type radiation-sensitive resin composition which comprises a 1,2-quinonediazide compound and an alkali-soluble novolac resin produced by poly-condensing phenols represented by the formulas (I) and (II) in a molar ratio of (I)/(II) of 1/99 to 100/0 with a carbonyl compound: ##STR1## wherein R.sup.1 and R.sup.2, which may be the same or different, represent hydroxyl groups, hydrogen atoms, alkyl groups, aryl groups, aralkyl groups, alkenyl groups, halogen atoms, alkoxy groups, alkoxycarbonyl groups, aroxycarbonyl groups, alkanoyloxy groups, aroyloxy groups, acyl groups, cyano groups or nitro groups, ##STR2## wherein R.sup.3, R.sup.4 and R.sup.5, which may be the same or different, represent hydrogen atoms, alkyl groups, aryl groups, aralkyl groups, alkenyl groups, halogen atoms, alkoxy groups, alkoxycarbonyl groups, aroxycarbonyl groups, alkanoyloxy groups, aroyloxy groups, acyl groups, cyano groups or nitro groups. The above positive type radiation-sensitive resin composition is excellent in dry-etching resistance, resolution and heat resistance, and appropriate as a positive type resist for producing integrated circuits in which a resist pattern is formed, and also as a positive type resist for producing a mask.

    摘要翻译： 一种阳离子型辐射敏感性树脂组合物，其包含1,2-醌二叠氮化合物和由式（I）和（II）表示的聚缩醛的酚缩合树脂，摩尔比为（I）/ （II），其中羰基化合物：其中R 1和R 2可以相同或不同，表示羟基，氢原子，烷基，芳基，芳烷基 ，烯基，卤素原子，烷氧基，烷氧基羰基，芳氧基羰基，烷酰氧基，芳氧基，酰基，氰基或硝基，其中R3，R4和R5可以相同， 不同的，表示氢原子，烷基，芳基，芳烷基，烯基，卤素原子，烷氧基，烷氧基羰基，芳氧基羰基，烷酰氧基，芳氧基，酰基，氰基或硝基。 上述正型辐射敏感性树脂组合物的耐干蚀刻性，分辨率和耐热性优异，并且适合作为用于制造其中形成抗蚀剂图案的集成电路的正型抗蚀剂，并且作为用于生产抗蚀剂图案的正型抗蚀剂 一个面具

    Radiation-sensitive resin composition
    8.
    发明授权
    Radiation-sensitive resin composition 失效
    辐射敏感树脂组合物

    公开(公告)号：US06228554B1

    公开(公告)日：2001-05-08

    申请号：US09414724

    申请日：1999-10-08

    申请人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita

    发明人： Yoshihiro Hosaka ,  Ikuo Nozue ,  Masashige Takatori ,  Yoshiyuki Harita

    IPC分类号： G03F7023

    CPC分类号： G03F7/0226 ,  G03F7/0048 ,  G03F7/0085

    摘要： A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymono-carboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含碱溶性树脂和辐射敏感性化合物在包含单一单羧酸酯的溶剂中的溶液。 该组合物具有高的储存稳定性（即，在储存期间形成非常少量的微粒），并且适合用作制造集成电路的抗蚀剂。

    Radiation-sensitive resin composition
    10.
    发明授权
    Radiation-sensitive resin composition 失效
    辐射敏感树脂组合物

    公开(公告)号：US5753406A

    公开(公告)日：1998-05-19

    申请号：US18221

    申请日：1993-02-16

    申请人： Satoshi Miyashita ,  Akihiro Yamanouchi ,  Ikuo Nozue ,  Takao Miura

    发明人： Satoshi Miyashita ,  Akihiro Yamanouchi ,  Ikuo Nozue ,  Takao Miura

    IPC分类号： C08G8/08 ,  G03F7/023

    CPC分类号： C08G8/08 ,  G03F7/0236

    摘要： A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alakli-soluble novolak resin comprises a mixture of: 95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 2,000-20,000 �Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I'): ##STR1## wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol represented by the above structural formula (I) or (I') with at least one aldehyde! and 5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 �Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II): ##STR2## wherein n is 0, 1, 2 or 3, with at least one aldehyde!. In the resin composition, the mixture of Resin A and Resin B may further contain Resin C which is an ester of Resin B with a 1,2-quinonediazidesulfonic acid.

    摘要翻译： 一种包含碱溶性酚醛清漆树脂和1,2-醌二叠氮化合物的辐射敏感性树脂组合物，其中所述可溶解酚醛清漆树脂包括：95-50重量份具有标准聚苯乙烯缩小重量的树脂A - 平均分子量为2,000-20,000 [树脂A为选自由间甲酚和至少一种由结构式（I）或（I'）表示的苯酚缩聚得到的树脂中的至少一种树脂： （I）其中m为2或3，与至少一种醛和通过间甲酚，对甲酚和至少一种由上述结构式表示的苯酚缩聚获得的树脂 （I）或（I'）与至少一种醛]和5-50重量份具有标准聚苯乙烯换算的重均分子量为200-2,000的树脂B [树脂B是通过缩聚 至少一种由结构式（II）表示的苯酚：其中n为 0,1,2或3与至少一种醛]。 在树脂组合物中，树脂A和树脂B的混合物可以进一步含有作为树脂B与1,2-醌二叠氮磺酸的酯的树脂C.