发明授权
- 专利标题: Resistive metal layers and method for making same
- 专利标题(中): 电阻金属层及其制造方法
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申请号: US750070申请日: 1991-08-26
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公开(公告)号: US5243320A公开(公告)日: 1993-09-07
- 发明人: Sidney J. Clouser , Chinho Lee , Mary K. Prokop , Christopher J. Whevell
- 申请人: Sidney J. Clouser , Chinho Lee , Mary K. Prokop , Christopher J. Whevell
- 申请人地址: OH Eastlake
- 专利权人: Gould Inc.
- 当前专利权人: Gould Inc.
- 当前专利权人地址: OH Eastlake
- 主分类号: C23F1/18
- IPC分类号: C23F1/18 ; C23F1/40 ; H01C7/00 ; H01C17/06 ; H01C17/16 ; H05K1/16 ; H05K3/02 ; H05K3/06 ; H05K3/38
摘要:
Electrodeposited planar resistive layers are disclosed, which may be combined with conductive layers and insulative layers to produce laminates useful in the preparation of printed circuit boards. The resistive layers are prepared by electroplating from an electroplating bath containing a source of a normally conductive metal component and a source of a non-metallic resistance increasing additive. Planar resistors may be produced which have sheet resistances in the range of from about 15 to about 1000 .OMEGA. per square.
公开/授权文献
- US5749691A Reaction nut with cam action quick fastening 公开/授权日:1998-05-12
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