发明授权
US5252133A Vertically oriented CVD apparatus including gas inlet tube having gas
injection holes
失效
包括具有气体注入孔的气体入口管的垂直取向的CVD装置
- 专利标题： Vertically oriented CVD apparatus including gas inlet tube having gas injection holes
- 专利标题（中）： 包括具有气体注入孔的气体入口管的垂直取向的CVD装置
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申请号： US809122申请日： 1991-12-18
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公开(公告)号： US5252133A公开(公告)日： 1993-10-12
- 发明人: Shinji Miyazaki , Yuichi Mikata , Takahiko Moriya , Reiji Niino , Motohiko Nishimura
- 申请人： Shinji Miyazaki , Yuichi Mikata , Takahiko Moriya , Reiji Niino , Motohiko Nishimura
- 申请人地址： JPX Kawasaki JPX Tokyo
- 专利权人： Kabushiki Kaisha Toshiba,Tokyo Electron Limited
- 当前专利权人： Kabushiki Kaisha Toshiba,Tokyo Electron Limited
- 当前专利权人地址： JPX Kawasaki JPX Tokyo
- 优先权： JPX2-403943 19901219
- 主分类号： H01L21/31
- IPC分类号： H01L21/31 ; C23C16/44 ; C23C16/455 ; C30B25/14 ; H01L21/205 ; H01L21/22 ; C23C16/00
摘要：
A vertically oriented CVD apparatus comprises a reaction chamber, a boat means vertically placed in the reaction chamber to horizontally support a plurality of semiconductor substrates, and a gas inlet tube including a plurality of gas injection holes along a longitudinal axis thereof and extending along a longitudinal side of the boat means to introduce a reaction gas into the reaction chamber. In the structure, a direction of each of the gas injection holes is set at an angle .theta. with respect to a reference line given by a straight line connecting a center of the gas inlet tube to a center of one of the semiconductor wafers, the angle .theta. being defined by 0.degree.
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