发明授权
US5273856A Positive working photoresist composition containing mid or near UV
radiation sensitive quinone diazide and sulfonic acid ester of imide or
oxime which does not absorb mid or near UV radiation
失效
含有中等或近紫外线辐射敏感醌二叠氮化物和不吸收中等或近紫外线辐射的酰亚胺或肟磺酸酯的正性光致抗蚀剂组合物
- 专利标题： Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation
- 专利标题（中）： 含有中等或近紫外线辐射敏感醌二叠氮化物和不吸收中等或近紫外线辐射的酰亚胺或肟磺酸酯的正性光致抗蚀剂组合物
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申请号： US606652申请日： 1990-10-31
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公开(公告)号： US5273856A公开(公告)日： 1993-12-28
- 发明人: Christopher F. Lyons , Stanley E. Perreault , Gary T. Spinillo , Robert L. Wood
- 申请人： Christopher F. Lyons , Stanley E. Perreault , Gary T. Spinillo , Robert L. Wood
- 申请人地址： NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： NY Armonk
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/022 ; G03F7/039 ; G03F7/09 ; H01L21/027 ; H01L21/30 ; G03F7/023 ; G03C1/61
摘要：
Positive photoresist compositions which comprise an alkali soluble resin material, a diazoquinone dissolution inhibitor which decompose on exposure to mid and near UV radiation, and a sulfonic acid ester of an imide or oxime which does not absorb such mid or near UV radiation. Resist images of high contrast are formed.
公开/授权文献
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