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1.发明授权Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation 失效含有中等或近紫外线辐射敏感醌二叠氮化物和不吸收中等或近紫外线辐射的酰亚胺或肟磺酸酯的正性光致抗蚀剂组合物
公开(公告)号：US5273856A
公开(公告)日：1993-12-28
申请号：US606652
申请日：1990-10-31
IPC分类号： G03F7/004 , G03F7/022 , G03F7/039 , G03F7/09 , H01L21/027 , H01L21/30 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226 , G03F7/091
摘要： Positive photoresist compositions which comprise an alkali soluble resin material, a diazoquinone dissolution inhibitor which decompose on exposure to mid and near UV radiation, and a sulfonic acid ester of an imide or oxime which does not absorb such mid or near UV radiation. Resist images of high contrast are formed.
摘要翻译： 包含碱溶性树脂材料的正性光致抗蚀剂组合物，在暴露于中和近紫外线辐射下分解的重氮醌溶解抑制剂，以及不吸收这种中等或近紫外辐射的酰亚胺或肟的磺酸酯。 形成高对比度的抗蚀图像。
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公开(公告)号：US5380621A
公开(公告)日：1995-01-10
申请号：US55400
申请日：1993-05-03
申请人： Robert R. Dichiara , Christopher F. Lyons , Ratnasabapathy Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： Robert R. Dichiara , Christopher F. Lyons , Ratnasabapathy Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/11 , G03F7/09 , H01L21/027 , H01L21/30 , G03C1/492
CPC分类号： G03F7/091 , Y10S522/904
摘要： An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
摘要翻译： 一种用于化学放大光致抗蚀剂组合物的抗反射涂料组合物（ARC），其包含对中和深紫外线辐射具有高吸收性的聚合物组合物，其对于与化学放大的光致抗蚀剂组合物的接触反应基本上是惰性的，并且不溶于显影剂 用于化学放大光致抗蚀剂组合物。
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公开(公告)号：US5482817A
公开(公告)日：1996-01-09
申请号：US315318
申请日：1994-09-29
申请人： Robert R. Dichiara , Christopher F. Lyons , Ratnasabapathy Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： Robert R. Dichiara , Christopher F. Lyons , Ratnasabapathy Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/11 , G03F7/09 , H01L21/027 , H01L21/30 , G03C5/00
CPC分类号： G03F7/091 , Y10S522/904
摘要： An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
摘要翻译： 一种用于化学放大光致抗蚀剂组合物的抗反射涂料组合物（ARC），其包含对中和深紫外线辐射具有高吸收性的聚合物组合物，其对于与化学放大的光致抗蚀剂组合物的接触反应基本上是惰性的，并且不溶于显影剂 用于化学放大光致抗蚀剂组合物。
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公开(公告)号：US5554485A
公开(公告)日：1996-09-10
申请号：US315271
申请日：1994-09-29
申请人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/11 , G03F7/09 , H01L21/027 , H01L21/30 , G03C5/00
CPC分类号： G03F7/091 , Y10S522/904
摘要： An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
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公开(公告)号：US5401614A
公开(公告)日：1995-03-28
申请号：US17938
申请日：1993-02-16
申请人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/11 , G03F7/09 , H01L21/027 , H01L21/30 , G03C5/00
CPC分类号： G03F7/091 , Y10S522/904
摘要： An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
摘要翻译： 一种用于化学放大光致抗蚀剂组合物的抗反射涂料组合物，其包含对中和深紫外线辐射具有高度吸收性的聚合物组合物，其对于与化学放大的光致抗蚀剂组合物的接触反应基本上是惰性的，并且其不溶于用于化学 放大的光致抗蚀剂组合物。
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公开(公告)号：US5607824A
公开(公告)日：1997-03-04
申请号：US281398
申请日：1994-07-27
申请人： James T. Fahey , Brian W. Herbst , Leo L. Linehan , Wayne M. Moreau , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： James T. Fahey , Brian W. Herbst , Leo L. Linehan , Wayne M. Moreau , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/004 , C08G65/40 , C08G67/00 , C09D171/00 , G03F7/09 , G03F7/11 , H01L21/027 , G03C1/825
CPC分类号： C08G65/4012 , C09D171/00 , G03F7/091 , C08G2650/64
摘要： A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
摘要翻译： 已经显示二苯甲酮和双酚A的共聚物具有DUV吸收性质。 因此，共聚物在微光刻应用中作为抗反射涂层具有特殊的用途。 将蒽掺入共聚物主链增强了在248nm的吸收。 用于共聚物的端塞可以根据用户的需要而广泛变化，并且可以选择以促进不同波长的粘附，稳定性和吸收。
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7.发明授权Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene 失效包含聚羟基苯乙烯的聚甲基丙烯酸甲酯共聚物的光致抗蚀剂组合物
公开(公告)号：US5561194A
公开(公告)日：1996-10-01
申请号：US412806
申请日：1995-03-29
申请人： Kathleen M. Cornett , Judy B. Dorn , Margaret C. Lawson , Leo L. Linehan , Wayne M. Moreau , Randolph J. Smith , Gary T. Spinillo
发明人： Kathleen M. Cornett , Judy B. Dorn , Margaret C. Lawson , Leo L. Linehan , Wayne M. Moreau , Randolph J. Smith , Gary T. Spinillo
CPC分类号： G03F7/0233
摘要： A polyalkylmethacrylate co-polymer of polyhydroxystyrene has been found to be an ideal blending partner in a novolak photoresist composition. The preferred co-polymer is poly(p-hydroxystyrene)-co-(methyl methacrylate). The co-polymer is fully miscible with novolaks and has a high thermal stability (>150.degree. C.).
摘要翻译： 已经发现聚羟基苯乙烯的聚烷基甲基丙烯酸酯共聚物在酚醛清漆光致抗蚀剂组合物中是理想的掺合配合物。 优选的共聚物是聚（对羟基苯乙烯） - 共 - （甲基丙烯酸甲酯）。 共聚物与酚醛清漆完全混溶，具有高热稳定性（> 150℃）。
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