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1.发明授权Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation 失效含有中等或近紫外线辐射敏感醌二叠氮化物和不吸收中等或近紫外线辐射的酰亚胺或肟磺酸酯的正性光致抗蚀剂组合物
公开(公告)号：US5273856A
公开(公告)日：1993-12-28
申请号：US606652
申请日：1990-10-31
IPC分类号： G03F7/004 , G03F7/022 , G03F7/039 , G03F7/09 , H01L21/027 , H01L21/30 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226 , G03F7/091
摘要： Positive photoresist compositions which comprise an alkali soluble resin material, a diazoquinone dissolution inhibitor which decompose on exposure to mid and near UV radiation, and a sulfonic acid ester of an imide or oxime which does not absorb such mid or near UV radiation. Resist images of high contrast are formed.
摘要翻译： 包含碱溶性树脂材料的正性光致抗蚀剂组合物，在暴露于中和近紫外线辐射下分解的重氮醌溶解抑制剂，以及不吸收这种中等或近紫外辐射的酰亚胺或肟的磺酸酯。 形成高对比度的抗蚀图像。
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公开(公告)号：US5380621A
公开(公告)日：1995-01-10
申请号：US55400
申请日：1993-05-03
申请人： Robert R. Dichiara , Christopher F. Lyons , Ratnasabapathy Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： Robert R. Dichiara , Christopher F. Lyons , Ratnasabapathy Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/11 , G03F7/09 , H01L21/027 , H01L21/30 , G03C1/492
CPC分类号： G03F7/091 , Y10S522/904
摘要： An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
摘要翻译： 一种用于化学放大光致抗蚀剂组合物的抗反射涂料组合物（ARC），其包含对中和深紫外线辐射具有高吸收性的聚合物组合物，其对于与化学放大的光致抗蚀剂组合物的接触反应基本上是惰性的，并且不溶于显影剂 用于化学放大光致抗蚀剂组合物。
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公开(公告)号：US5482817A
公开(公告)日：1996-01-09
申请号：US315318
申请日：1994-09-29
申请人： Robert R. Dichiara , Christopher F. Lyons , Ratnasabapathy Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： Robert R. Dichiara , Christopher F. Lyons , Ratnasabapathy Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/11 , G03F7/09 , H01L21/027 , H01L21/30 , G03C5/00
CPC分类号： G03F7/091 , Y10S522/904
摘要： An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
摘要翻译： 一种用于化学放大光致抗蚀剂组合物的抗反射涂料组合物（ARC），其包含对中和深紫外线辐射具有高吸收性的聚合物组合物，其对于与化学放大的光致抗蚀剂组合物的接触反应基本上是惰性的，并且不溶于显影剂 用于化学放大光致抗蚀剂组合物。
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公开(公告)号：US5554485A
公开(公告)日：1996-09-10
申请号：US315271
申请日：1994-09-29
申请人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/11 , G03F7/09 , H01L21/027 , H01L21/30 , G03C5/00
CPC分类号： G03F7/091 , Y10S522/904
摘要： An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
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公开(公告)号：US5401614A
公开(公告)日：1995-03-28
申请号：US17938
申请日：1993-02-16
申请人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/11 , G03F7/09 , H01L21/027 , H01L21/30 , G03C5/00
CPC分类号： G03F7/091 , Y10S522/904
摘要： An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
摘要翻译： 一种用于化学放大光致抗蚀剂组合物的抗反射涂料组合物，其包含对中和深紫外线辐射具有高度吸收性的聚合物组合物，其对于与化学放大的光致抗蚀剂组合物的接触反应基本上是惰性的，并且其不溶于用于化学 放大的光致抗蚀剂组合物。
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公开(公告)号：US5607824A
公开(公告)日：1997-03-04
申请号：US281398
申请日：1994-07-27
申请人： James T. Fahey , Brian W. Herbst , Leo L. Linehan , Wayne M. Moreau , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： James T. Fahey , Brian W. Herbst , Leo L. Linehan , Wayne M. Moreau , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/004 , C08G65/40 , C08G67/00 , C09D171/00 , G03F7/09 , G03F7/11 , H01L21/027 , G03C1/825
CPC分类号： C08G65/4012 , C09D171/00 , G03F7/091 , C08G2650/64
摘要： A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
摘要翻译： 已经显示二苯甲酮和双酚A的共聚物具有DUV吸收性质。 因此，共聚物在微光刻应用中作为抗反射涂层具有特殊的用途。 将蒽掺入共聚物主链增强了在248nm的吸收。 用于共聚物的端塞可以根据用户的需要而广泛变化，并且可以选择以促进不同波长的粘附，稳定性和吸收。
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7.发明授权Tailoring of novolak and diazoquinone positive resists by acylation of novolak 失效通过酚醛清漆的酰化调节酚醛清漆和重氮醌正抗蚀剂
公开(公告)号：US4564575A
公开(公告)日：1986-01-14
申请号：US560781
申请日：1984-01-30
IPC分类号： G03C1/72 , C08G8/00 , C08G8/32 , G03C1/52 , G03F7/022 , G03F7/023 , H01L21/027 , G03C1/60 , G03C1/76 , G03F7/26
CPC分类号： G03F7/0236
摘要： Reduction of the alkaline developer solubility of novolak-diazoquinone positive resists by acylation of phenolic hydroxyl groups of the novolak resin.
摘要翻译： 通过酚醛清漆树脂的酚羟基的酰化，还原酚醛清漆 - 重氮醌阳性抗蚀剂的碱性显影剂溶解度。
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公开(公告)号：US6057080A
公开(公告)日：2000-05-02
申请号：US987073
申请日：1997-12-09
申请人： William R. Brunsvold , George J. Hefferon , Christopher F. Lyons , Wayne M. Moreau , Robert L. Wood
发明人： William R. Brunsvold , George J. Hefferon , Christopher F. Lyons , Wayne M. Moreau , Robert L. Wood
摘要： Enhanced fidelity of pattern transfer of aqueous developable photoresist compositions is achieved with top antireflective coatings which are fluorine-containing and have a refractive index approximately equal to the square root of the underlying photoresist and which are removable in the developer for the photoresist.
摘要翻译： 水性可显影光致抗蚀剂组合物的图案转印的增强的保真度是通过含氟的顶部抗反射涂层实现的，其折射率近似等于下面的光致抗蚀剂的平方根，并且可在光致抗蚀剂的显影剂中除去。
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公开(公告)号：US5240812A
公开(公告)日：1993-08-31
申请号：US793884
申请日：1991-11-18
申请人： Willard E. Conley , Ranee W. Kwong , Richard J. Kvitek , Robert N. Lang , Christopher F. Lyons , Steve S. Miura , Wayne M. Moreau , Harbans S. Sachdev , Robert L. Wood
发明人： Willard E. Conley , Ranee W. Kwong , Richard J. Kvitek , Robert N. Lang , Christopher F. Lyons , Steve S. Miura , Wayne M. Moreau , Harbans S. Sachdev , Robert L. Wood
IPC分类号： G03F7/09
CPC分类号： G03F7/092
摘要： A protective material for use as an overcoating film for acid catalyzed resist compositions comprising a polymeric film forming compound, the films of which are impermeable to vapors of organic and inorganic bases.
摘要翻译： 用作酸催化抗蚀剂组合物的外涂膜的保护材料，其包含聚合物成膜化合物，其膜对有机和无机碱的蒸气是不可渗透的。
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公开(公告)号：US5744537A
公开(公告)日：1998-04-28
申请号：US863678
申请日：1997-05-27
申请人： William R. Brunsvold , George J. Hefferon , Christopher F. Lyons , Wayne M. Moreau , Robert L. Wood
发明人： William R. Brunsvold , George J. Hefferon , Christopher F. Lyons , Wayne M. Moreau , Robert L. Wood
CPC分类号： G03F7/091 , G03F7/092 , Y10T428/3154
摘要： Enhanced fidelity of pattern transfer of aqueous developable photoresist compositions is achieved with top antirefective coatings which are fluorine-containing and have a refractive index approximately equal to the square root of the underlying photoresist and which are removable in the developer for the photoresist.
摘要翻译： 水性可显影光致抗蚀剂组合物的图案转印的增强的保真度是通过含氟的顶部抗有效涂层实现的，其折射率近似等于下面光致抗蚀剂的平方根，并且可在光致抗蚀剂的显影剂中除去。
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