发明授权
- 专利标题: CVD diamond by alternating chemical reactions
- 专利标题(中): CVD金刚石交替进行化学反应
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申请号: US956817申请日: 1992-10-05
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公开(公告)号: US5302231A公开(公告)日: 1994-04-12
- 发明人: Harold P. Bovenkerk , Thomas R. Anthony , James F. Fleischer , William F. Banholzer
- 申请人: Harold P. Bovenkerk , Thomas R. Anthony , James F. Fleischer , William F. Banholzer
- 申请人地址: OH Worthington
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: OH Worthington
- 主分类号: C23C16/26
- IPC分类号: C23C16/26 ; C23C16/27 ; C30B25/02 ; C30B29/04 ; C30B25/00
摘要:
The present invention relates to a method for growing diamond on a diamond substrate by chemical vapor deposition. The inventive method comprises alternatingly contacting at elevated temperature said diamond substrate with a gas having the formula C.sub.n X.sub.m and then with a gas having the formula C.sub.l Z.sub.p. X and Z each form single bonds with carbon. X and Z also are reactable to form ZX or a derivative thereof. The Z--X bond is stronger than the C--X bond and also is stronger than the C--Z bond. In the formulas, n, m, l, and p are integers. If C.sub.n X.sub.m and C.sub.l Z.sub.p do not react in the gas phase, then a gas mixture of them can be used to grow diamond instead of the alternating exposure of one and then the other.
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