发明授权
- 专利标题: Method for fabricating superconducting materials and superconductive thin films
- 专利标题(中): 制造超导材料和超导薄膜的方法
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申请号: US560844申请日: 1990-07-24
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公开(公告)号: US5316585A公开(公告)日: 1994-05-31
- 发明人: Yukio Okamoto , Toshiyuki Aida , Katsuki Miyauchi , Kazumasa Takagi , Tokuumi Fukazawa , Shinji Takayama
- 申请人: Yukio Okamoto , Toshiyuki Aida , Katsuki Miyauchi , Kazumasa Takagi , Tokuumi Fukazawa , Shinji Takayama
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-196186 19870807; JPX62-251497 19871007
- 主分类号: C23C4/10
- IPC分类号: C23C4/10 ; C23C14/00 ; C23C14/08 ; C23C14/32 ; C23C16/40 ; C23C16/517 ; H01L39/24
摘要:
Chemical reactions of superconducting raw materials with active oxygen atoms and their charged particles are accelerated by using at least oxygen plasma in the fabrication process of a superconductive body. Thereby an ionic crystal is grown in a short time, which provides stable superconducting materials of high quality such as high critical temperature and low resistivity. In another aspect, a substrate is irradiated simultaneously with streams of vapor of metal elements, of which a superconductive body is to be composed, and a stream of gas of ions generated in a plasma chamber and film growth is effected while keeping the substrate at a temperature higher than 400.degree. C. to produce a ceramic type superconductive thin film.
公开/授权文献
- US4537326A Protector for drink opening 公开/授权日:1985-08-27
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