发明授权
- 专利标题: Method of and apparatus for preparing oxide superconducting film
- 专利标题(中): 制备氧化物超导薄膜的方法和设备
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申请号: US952928申请日: 1992-09-25
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公开(公告)号: US5334252A公开(公告)日: 1994-08-02
- 发明人: Noriyuki Yoshida , Satoshi Takano , Shigeru Okuda , Noriki Hayashi , Tsukushi Hara , Kiyoshi Okaniwa , Takahiko Yamamoto
- 申请人: Noriyuki Yoshida , Satoshi Takano , Shigeru Okuda , Noriki Hayashi , Tsukushi Hara , Kiyoshi Okaniwa , Takahiko Yamamoto
- 申请人地址: JPX Osaka
- 专利权人: Sumimoto Electric Industries, Ltd.
- 当前专利权人: Sumimoto Electric Industries, Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX2-52522 19900302; JPX2-52523 19900302; JPX2-52524 19900302; JPX3-30403 19910215
- 主分类号: C01B13/14
- IPC分类号: C01B13/14 ; C01G1/00 ; C01G3/00 ; C23C14/00 ; C23C14/08 ; C23C14/28 ; C23C14/34 ; C30B23/08 ; C30B29/22 ; H01B12/06 ; H01B13/00 ; H01L39/24
摘要:
In order to enable formation of a smooth and dense oxide superconducting film with no clear appearance of grain boundaries in a fine structure even at a high film forming rate, a laser ablation method is employed to apply a laser beam 2 to a target 1 containing components of an oxide superconductive material and deposit particles, which are thus scattered from the target 1, on a substrate 3, while gaseous oxygen is supplied from a gaseous oxygen inlet 7 toward laser plasma 6, which is generated by the application of the laser beam 2.
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