发明授权
- 专利标题: Resonant tunneling fet and methods of fabrication
- 专利标题(中): 谐振隧道和制造方法
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申请号: US386171申请日: 1995-02-09
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公开(公告)号: US5552330A公开(公告)日: 1996-09-03
- 发明人: Saied N. Tehrani , Herbert Goronkin , Jun Shen , Xiaodong T. Zhu
- 申请人: Saied N. Tehrani , Herbert Goronkin , Jun Shen , Xiaodong T. Zhu
- 申请人地址: IL Schaumburg
- 专利权人: Motorola
- 当前专利权人: Motorola
- 当前专利权人地址: IL Schaumburg
- 主分类号: H01L29/68
- IPC分类号: H01L29/68 ; H01L21/20 ; H01L21/334 ; H01L27/06 ; H01L29/205 ; H01L29/76 ; H01L21/265 ; H01L21/44
摘要:
A resonant tunneling FET including a heterostructure FET with a channel layer having a first current contact and a control contact operatively coupled thereto and a resonant tunneling device, including a quantum well layer sandwiched between barrier layers with a resonant tunneling layer affixed to an opposite side of one barrier layer, operably affixed to the heterostructure FET to form a second current contact. The resonant tunneling FET being constructed from a material system which allows the fabrication of additional devices on the same substrate.
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