发明授权
US5682323A System and method for performing optical proximity correction on
macrocell libraries
失效
在宏单元库上执行光学邻近校正的系统和方法
- 专利标题: System and method for performing optical proximity correction on macrocell libraries
- 专利标题(中): 在宏单元库上执行光学邻近校正的系统和方法
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申请号: US401099申请日: 1995-03-06
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公开(公告)号: US5682323A公开(公告)日: 1997-10-28
- 发明人: Nicholas Pasch , Nicholas Eib , Jeffrey Dong
- 申请人: Nicholas Pasch , Nicholas Eib , Jeffrey Dong
- 申请人地址: CA Santa Clara
- 专利权人: LSI Logic Corporation
- 当前专利权人: LSI Logic Corporation
- 当前专利权人地址: CA Santa Clara
- 主分类号: G03F1/00
- IPC分类号: G03F1/00 ; G03F1/36 ; G06F17/50 ; H01L21/027 ; G06F15/00 ; H01L29/76
摘要:
The system and method performs optical proximity correction on an integrated circuit (IC) mask design by initially performing optical proximity correction on a library of cells that are used to create the IC. The pre-tested cells are imported onto a mask design. All cells are placed a minimum distance apart to ensure that no proximity effects will occur between elements fully integrated in different cells. An optical proximity correction technique is performed on the mask design by performing proximity correction only on those components, e.g., lines, that are not fully integrated within one cell.
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