Apparatus comprising an array of switches and display
    1.
    发明申请
    Apparatus comprising an array of switches and display 审中-公开
    一种装置,包括一组开关和显示器

    公开(公告)号:US20070046214A1

    公开(公告)日:2007-03-01

    申请号:US11485539

    申请日:2006-07-11

    申请人: Nicholas Pasch

    发明人: Nicholas Pasch

    IPC分类号: G09G3/10

    摘要: A class of electromechanical switch cell is disclosed that has improved switching speed and tolerance to array non-planarity, among other advantages. In one embodiment, the switch cell can include a movable foil that is anchored to the structure, but is not under tension in the unbiased state. In another embodiment, a flexible foil may be mechanically biased so that a portion of the foil is positioned proximate to a reference substrate.

    摘要翻译: 公开了一类机电开关电池,其具有改进的开关速度和对阵列非平面性的容限以及其他优点。 在一个实施例中,开关单元可以包括固定到结构上但不处于无偏压状态的可动箔。 在另一个实施例中,柔性箔可以被机械偏置,使得箔的一部分定位成靠近参考衬底。

    Method for forming an electrical contact in an integrated circuit
    2.
    发明授权
    Method for forming an electrical contact in an integrated circuit 失效
    在集成电路中形成电接点的方法

    公开(公告)号:US4631248A

    公开(公告)日:1986-12-23

    申请号:US747474

    申请日:1985-06-21

    申请人: Nicholas Pasch

    发明人: Nicholas Pasch

    摘要: A contact (15) formed in accordance with the present invention includes rounded corners on the upper and lower surface and sloped walls in the dielectric material (10) in which the contact is formed. In one embodiment, a photolithographic mask is formed above the dielectric material (10) using photolithographic techniques well known in the art. Using reactive ion etching techniques, the contact is etched until a small portion of the dielectric material remains to be etched in the contact. The photolithographic mask is then removed. The contact is then completely etched using a reactive ion etching process. Using this technique, the contact formed has rounded upper edges.

    摘要翻译: 根据本发明形成的触点(15)包括上表面和下表面上的圆角以及形成触点的电介质材料(10)中的倾斜壁。 在一个实施例中,使用本领域公知的光刻技术在电介质材料(10)的上方形成光刻掩模。 使用反应离子蚀刻技术,蚀刻接触,直到介电材料的一小部分在接触中保持被蚀刻。 然后去除光刻掩模。 然后使用反应离子蚀刻工艺完全蚀刻接触。 使用这种技术,形成的触点具有圆形的上边缘。

    Optical shutter for a display apparatus comprising an array of switches
    3.
    发明申请
    Optical shutter for a display apparatus comprising an array of switches 审中-公开
    一种用于包括开关阵列的显示装置的光学快门

    公开(公告)号:US20070046594A1

    公开(公告)日:2007-03-01

    申请号:US11485060

    申请日:2006-07-11

    申请人: Nicholas Pasch

    发明人: Nicholas Pasch

    IPC分类号: G09G3/34

    CPC分类号: G09F9/375 G02B26/02 G09F9/372

    摘要: A class of electromechanical switch cell including an optical shutter mechanism suited for use as an optical light valve, light curtain, and/or other display applications, is disclosed. An optical shutter in accordance with embodiments of the present invention can include a first set of opaque elements on a substrate foil and a second set of opaque elements on an opposing surface of a moveable foil. By translating the moveable foil, the second set of opaque elements can be made to alternatively be in optical misalignment with the first set of opaque elements, in which case light may not pass through the cell, or in optical alignment with the first set, in which case light may pass through the cell.

    摘要翻译: 公开了一类包括适于用作光阀,光幕和/或其他显示应用的光学快门机构的机电开关单元。 根据本发明实施例的光学快门可以包括衬底箔上的第一组不透明元件和可移动箔的相对表面上的第二组不透明元件。 通过平移可移动的箔片,可以使第二组不透明元件交替地制成与第一组不透明元件的光学偏移,在这种情况下,光不能通过电池,或者与第一组光学对准, 哪种情况下,光可以通过电池。

    Picture element using microelectromechanical switch
    4.
    发明申请
    Picture element using microelectromechanical switch 审中-公开
    图片元素采用微机电开关

    公开(公告)号:US20060202933A1

    公开(公告)日:2006-09-14

    申请号:US11361314

    申请日:2006-02-24

    IPC分类号: G09G3/36

    CPC分类号: H01H59/0009 H01H1/645

    摘要: A robust microelectromechanical switch. In an illustrative embodiment, the switch is adapted for use in a display and includes a first flexible surface and a second surface. The second surface is angled relative to the first surface, forming a wedge the first surface and the second surface. A first terminal and a second terminal are positioned relative to the first flexible surface and the second surface so that selective flexing of the flexible surface electrically couples or uncouples the first terminal to the second terminal. In a more specific embodiment, the switch further includes a first mechanism for selectively applying an electrostatic force between the first flexible surface and the second surface. The first surface is positioned on a first elastic flexible layer, and the second surface is positioned on a second layer. The first mechanism includes a first actuator electrode that is coupled to the first surface, and a second actuator electrode that is coupled to the second surface. A sufficient charge differential applied between the first actuator electrode and the second actuator electrode will attract the first electrode to the second electrode, thereby flexing the flexible layer toward the second layer. The sidewalls define a perimeter of a cell that houses the switch. A protrusion extends from a third layer between the sidewalls, thereby indenting the first layer, and thereby forming the wedge.

    摘要翻译: 坚固的微机电开关。 在说明性实施例中,开关适用于显示器并且包括第一柔性表面和第二表面。 第二表面相对于第一表面成角度,在第一表面和第二表面上形成楔形物。 第一端子和第二端子相对于第一柔性表面和第二表面定位,使得柔性表面的选择性挠曲将第一端子电耦合或断开到第二端子。 在更具体的实施例中,开关还包括用于在第一柔性表面和第二表面之间选择性地施加静电力的第一机构。 第一表面位于第一弹性柔性层上,第二表面位于第二层上。 第一机构包括耦合到第一表面的第一致动器电极和耦合到第二表面的第二致动器电极。 施加在第一致动器电极和第二致动器电极之间的足够的电荷差将吸引第一电极到第二电极,从而使柔性层向第二层弯曲。 侧壁限定容纳开关的电池的周边。 突起从侧壁之间的第三层延伸,从而压入第一层,从而形成楔形物。

    Micro-electromechanical switch array
    5.
    发明申请
    Micro-electromechanical switch array 审中-公开
    微机电开关阵列

    公开(公告)号:US20050236260A1

    公开(公告)日:2005-10-27

    申请号:US11046325

    申请日:2005-01-27

    IPC分类号: H01H57/00 H01H59/00

    摘要: Micro-electromechanical devices having an improved flexible layer enable the use of material having a wider range of elastic modulus. The MEM devices include a substantially non-pliable layer and a substantially flexible layer both of which include electrodes that when energized will create electrostatic forces that attracts the flexible layer to the non-pliable layer. The flexible layer has perforations or apertures cut into the flexible layer of a MEMs device to alter operational properties such as electrostatic sensitivity, resonance frequency, rate of change of sensitivity above the resonance frequency, oscillating mass, panel stiffness and others parameters.

    摘要翻译: 具有改进的柔性层的微机电装置能够使用具有更宽范围的弹性模量的材料。 MEM器件包括基本上不柔软的层和基本上柔性的层,两者都包括电极,当被激发时将产生吸引柔性层到非柔性层的静电力。 柔性层具有切割到MEMs装置的柔性层中的穿孔或孔,以改变诸如静电敏感性,共振频率,谐振频率以上的灵敏度变化率,振动质量,面板刚度等参数的操作性能。

    Electrostatic printers using micro electro-mechanical switching elements
    6.
    发明申请
    Electrostatic printers using micro electro-mechanical switching elements 失效
    静电打印机采用微机电开关元件

    公开(公告)号:US20050134644A1

    公开(公告)日:2005-06-23

    申请号:US11019506

    申请日:2004-12-20

    IPC分类号: B41J2/14 B41J2/135

    CPC分类号: B41J2/14314

    摘要: The present invention relates to a printer system that incorporates an electrically addressable array of micro electro-mechanical switches of arbitrary width. In one embodiment, array of micro electro-mechanical switches of arbitrary width that comprises an electrostatic array used to attract fusible toner or electrically charged ink droplets from a hopper or ink jet assembly to a piece of paper or other printable substrate. The electrostatic array uses electrostatic latching to create the charged environment to allow the toner or ink to be attracted from the hopper or ink jet assembly toward the array. A piece of paper is interposed between the array and the hopper or ink jet assembly. Additional micro electro-mechanical switches control the release of the ink droplets from the ink jet assembly. The micro electro-mechanical switches each comprise a sealed cell that relies on pneumatic restoration forces to insure that switch contacts can be successfully broken as desired.

    摘要翻译: 本发明涉及一种包含任意宽度的微机电开关的电可寻址阵列的打印机系统。 在一个实施例中,任意宽度的微机电开关阵列包括用于将可熔调色剂或带电荷的墨滴从料斗或喷墨组件吸引到一张纸或其它可印刷基底的静电阵列。 静电阵列使用静电锁定来产生充电环境,以允许调色剂或墨水从料斗或喷墨组件向阵列吸引。 一块纸介于阵列和料斗或喷墨组件之间。 附加的微机电开关控制墨滴从喷墨组件的释放。 微机电开关各自包括依靠气动恢复力的密封电池,以确保开关触点可以根据需要成功地断开。

    System and method for performing optical proximity correction on
macrocell libraries
    7.
    发明授权
    System and method for performing optical proximity correction on macrocell libraries 失效
    在宏单元库上执行光学邻近校正的系统和方法

    公开(公告)号:US5682323A

    公开(公告)日:1997-10-28

    申请号:US401099

    申请日:1995-03-06

    CPC分类号: G06F17/5068 G03F1/36

    摘要: The system and method performs optical proximity correction on an integrated circuit (IC) mask design by initially performing optical proximity correction on a library of cells that are used to create the IC. The pre-tested cells are imported onto a mask design. All cells are placed a minimum distance apart to ensure that no proximity effects will occur between elements fully integrated in different cells. An optical proximity correction technique is performed on the mask design by performing proximity correction only on those components, e.g., lines, that are not fully integrated within one cell.

    摘要翻译: 该系统和方法通过在用于创建IC的单元格库上最初执行光学邻近校正来对集成电路(IC)掩模设计执行光学邻近校正。 预先测试的细胞被导入到面罩设计中。 所有细胞被放置在最小距离之间,以确保在完全集成在不同细胞中的元素之间不会发生邻近效应。 通过仅对在一个单元内未完全集成的那些组件(例如线)进行接近校正来对掩模设计执行光学邻近校正技术。