发明授权
US5698362A 1,2 quinone diazide photosensitive resin composition containing select
additive and method for forming a photoresist pattern
失效
含有选择添加剂的1,2醌二叠氮类感光性树脂组合物和形成光致抗蚀剂图案的方法
- 专利标题： 1,2 quinone diazide photosensitive resin composition containing select additive and method for forming a photoresist pattern
- 专利标题（中）： 含有选择添加剂的1,2醌二叠氮类感光性树脂组合物和形成光致抗蚀剂图案的方法
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申请号： US818894申请日： 1997-03-17
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公开(公告)号： US5698362A公开(公告)日： 1997-12-16
- 发明人: Mineo Nishi , Koji Nakano , Makoto Ikemoto , Tadashi Kusumoto , Yasuhiro Kawase
- 申请人： Mineo Nishi , Koji Nakano , Makoto Ikemoto , Tadashi Kusumoto , Yasuhiro Kawase
- 申请人地址： JPX Tokyo
- 专利权人： Mitsubishi Chemical Corporation
- 当前专利权人： Mitsubishi Chemical Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX6-213927 19940907
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/022 ; G03F7/023 ; G03C1/61
摘要：
A photosensitive resin composition comprising an alkali-soluble resin (A), a compound (B) containing a 1,2-quinonediazide group, and a compound (C) of the following formula (I): ##STR1## wherein each of Ar.sup.1 to Ar.sup.3 which are independent of one another, is an aromatic hydrocarbon group which may be substituted by a halogen atom, a C.sub.1-4 alkyl group or a C.sub.1-4 alkoxy group, and R is a hydrogen atom, a hydroxyl group, a C.sub.1-4 alkyl group or a C.sub.1-4 alkoxy group.
公开/授权文献
- US4162971A Injectors with deflectors for their use in gassing liquids 公开/授权日：1979-07-31
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