公开(公告)号：US5447825A

公开(公告)日：1995-09-05

申请号：US299079

申请日：1994-08-31

申请人： Mineo Nishi ,  Koji Nakano ,  Yoshihiro Takada

发明人： Mineo Nishi ,  Koji Nakano ,  Yoshihiro Takada

IPC分类号： G03F7/023 ,  G03F7/30

CPC分类号： G03F7/0236

摘要： A photosensitive resin composition comprising an alkali-soluble resin, a quinonediazide-type photosensitive compound and a solvent, as the main components, wherein the alkali-soluble resin is a polycondensation product of 1 at least one phenolic compound of the following formula (A) and 2 (a) formaldehyde and (b) at least one ketone or aldehyde of the following formula (B), and the mixing ratio of the formaldehyde (a) to the ketone or aldehyde (b) is within a range of from 1/99 to 99/1 in terms of the molar ratio of (a)/(b): ##STR1## wherein R.sup.1 is a group of the formula R.sup.2,OR.sup.3,COOR.sup.4 or CH.sub.2 COOR.sup.5,wherein R.sup.2 is a C.sub.1-4 alkyl group, each of R.sup.3,R.sup.4 and R.sup.5 which are independent of one another, is a hydrogen atom or a C.sub.1-4 alkyl group, n is an integer of from 0 to 3, provided that when n is 2 or 3, a plurality of R.sup.1 may be the same or different, and each of R.sup.6 and R.sup.7 which are independent of each other, is a hydrogen atom, a C.sub.1-4 lower alkyl group, an aryl group or an aralkyl group, provided that R.sup.6 and R.sup.7 are not simultaneously hydrogen atoms.

摘要翻译： 一种包含碱溶性树脂，醌二叠氮化物型感光性化合物和溶剂作为主要成分的感光性树脂组合物，其中碱溶性树脂是+ E，crc / 1 /至少一种酚类化合物的缩聚产物 以下式（A）和+ E，crc / 2 /（a）甲醛和（b）至少一种下式（B）的酮或醛，以及甲醛（a）与酮的混合比或 醛（b）的摩尔比为（a）/（b）：式R 2，OR 3，COOR 4或CH 2 COOR 5的摩尔比为1/99至99/1的范围，其中R2为C1- 4个烷基，R 3，R 4和R 5各自独立地是氢原子或C 1-4烷基，n是0-3的整数，条件是当n是2或3时，a 多个R 1可以相同或不同，R 6和R 7各自独立地为氢原子，C 1-4低级烷基，芳基或芳烷基，条件是R 6和 R7不是同时是氢原子。

公开(公告)号：US5759736A

公开(公告)日：1998-06-02

申请号：US829959

申请日：1997-04-01

申请人： Mineo Nishi ,  Koji Nakano ,  Tadashi Kusumoto ,  Yasuhiro Kawase

发明人： Mineo Nishi ,  Koji Nakano ,  Tadashi Kusumoto ,  Yasuhiro Kawase

IPC分类号： G03F7/022 ,  G03F7/023

CPC分类号： G03F7/0226

摘要： A photoresist composition comprising an alkali-soluble resin (A) and a radiation sensitive compound (B), as main components, which further contains a compound (C) of the following formula (I): ##STR1## wherein each of R.sup.1 to R.sup.4 which are independent of one another, is a hydrophobic substituent or a hydrogen atom, provided that all of R.sup.1 to R.sup.4 are not simultaneously hydrogen atoms, and each of a to d which are independent of one another, is an integer of from 1 to 5, and when any one of R.sup.1 to R.sup.4 is present in a plurality, the plurality of such any one of R.sup.1 to R.sup.4 may be the same or different.

摘要翻译： （I）的化合物（C），作为主要成分的含有碱溶性树脂（A）和辐射敏感性化合物（B）的光致抗蚀剂组合物：其中， R 1〜R 4彼此独立的是疏水性取代基或氢原子，条件是所有的R 1至R 4不是同时为氢原子，并且彼此独立的a至d中的每一个为 1至5，并且当R 1至R 4中的任何一个存在多个时，R 1至R 4中的任何一个可以相同或不同。

公开(公告)号：US5514526A

公开(公告)日：1996-05-07

申请号：US182159

申请日：1994-02-02

申请人： Mineo Nishi ,  Hideo Makishima

发明人： Mineo Nishi ,  Hideo Makishima

IPC分类号： G03F7/09 ,  G03F7/20 ,  G03C5/00 ,  G03C1/73

CPC分类号： G03F7/70583 ,  G03F7/091

摘要： A composition for forming anti-reflection film on resist surface which comprises an aqueous solution of a water soluble fluorine compound, and a pattern formation method which comprises the steps of coating a photoresist composition on a substrate; coating the above-mentioned composition for forming anti-reflection film; exposing the coated film to form a specific pattern; and developing the photoresist, are provided. Since the composition for forming anti-reflection film can be coated on the photoresist in the form of an aqueous solution, not only the anti-reflection film can be formed easily, but also, the film can be removed easily by rinsing with water or alkali development. Therefore, by the pattern formation method according to the present invention, it is possible to form a pattern easily with a high dimensional accuracy.

摘要翻译： PCT No.PCT / JP93 / 00711 Sec。 371日期：1994年2月2日 102（e）日期1994年2月2日PCT提交1993年5月27日PCT公布。 公开号WO93 / 24860 日本1993年12月9日。用于在抗蚀剂表面上形成抗反射膜的组合物，其包含水溶性氟化合物的水溶液和图案形成方法，其包括在基材上涂布光致抗蚀剂组合物的步骤; 涂覆上述用于形成抗反射膜的组合物; 将涂膜曝光形成特定图案; 并提供显影光致抗蚀剂。 由于用于形成抗反射膜的组合物可以以水溶液的形式涂覆在光致抗蚀剂上，不仅可以容易地形成抗反射膜，而且可以通过用水或碱进行漂洗来容易地除去膜 发展。 因此，通过根据本发明的图案形成方法，可以容易地以高尺寸精度形成图案。

公开(公告)号：US5698362A

公开(公告)日：1997-12-16

申请号：US818894

申请日：1997-03-17

申请人： Mineo Nishi ,  Koji Nakano ,  Makoto Ikemoto ,  Tadashi Kusumoto ,  Yasuhiro Kawase

发明人： Mineo Nishi ,  Koji Nakano ,  Makoto Ikemoto ,  Tadashi Kusumoto ,  Yasuhiro Kawase

IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  G03C1/61

CPC分类号： G03F7/0226 ,  G03F7/0045 ,  G03F7/022

摘要： A photosensitive resin composition comprising an alkali-soluble resin (A), a compound (B) containing a 1,2-quinonediazide group, and a compound (C) of the following formula (I): ##STR1## wherein each of Ar.sup.1 to Ar.sup.3 which are independent of one another, is an aromatic hydrocarbon group which may be substituted by a halogen atom, a C.sub.1-4 alkyl group or a C.sub.1-4 alkoxy group, and R is a hydrogen atom, a hydroxyl group, a C.sub.1-4 alkyl group or a C.sub.1-4 alkoxy group.

摘要翻译： 包含碱溶性树脂（A），含有1,2-醌二叠氮化物的化合物（B）和下式（I）的化合物（C））的光敏树脂组合物：其中各自 彼此独立的Ar 1〜Ar 3为可被卤素原子，C 1-4烷基或C 1-4烷氧基取代的芳香族烃基，R为氢原子，羟基， C 1-4烷基或C 1-4烷氧基。

公开(公告)号：US5660967A

公开(公告)日：1997-08-26

申请号：US579269

申请日：1995-12-27

申请人： Mineo Nishi ,  Koji Nakano ,  Yoshihiro Takada

发明人： Mineo Nishi ,  Koji Nakano ,  Yoshihiro Takada

IPC分类号： C08G8/28 ,  G03F7/023 ,  G03F7/30

CPC分类号： C08G8/28 ,  G03F7/023

摘要： A photosensitive resin composition comprising an alkali-soluble resin, a quinonediazide type photosensitive compound and a solvent, in which the quinonediazide type photosensitive compound contains a quinonediazide sulfonic acid ester of a polycondensate (d) of at least one phenolic compound (a) of the formula (A) with at least one hydroxy aromatic aldehydes (b) of the formula (B) and at least one carbonyl compounds (c) of the formula (C), and the mixing ratio ((b)/(c) mol ratio) of the hydroxy aromatic aldehydes (b)/the carbonyl compounds (c) is from 1/99 to 99/1, and the polycondensate (d) has a weight average molecular weight of from 600 to 2,000 in terms of polystyrene calculation: ##STR1## (wherein R.sup.1 is an alkyl group having a carbon number of from 1 to 4, an alkoxy group having a carbon number of from 1 to 4 or a hydroxyl group, R.sup.2 is an alkyl group having a carbon number of from 1 to 4 or an alkoxy group having a carbon number of from 1 to 4, R.sup.3 and R.sup.4 are respectively a hydrogen atom, an alkyl group having a carbon number of from 1 to 4, an aryl group or an aralkyl group, l is an integer of from 0 to 3, m is an integer of from 0 to 4, n is an integer of from 1 to 5, and the total number of m and n is not more than 5, provided that plural R.sup.1 or R.sup.2 may be respectively the same or different when l or m is an integer of at least 2).

摘要翻译： 一种包含碱溶性树脂，醌二叠氮化物型光敏化合物和溶剂的感光性树脂组合物，其中醌二叠氮化物型光敏化合物含有至少一种酚化合物（a）的缩聚物（d）的醌二叠氮化物磺酸酯 式（A）与式（B）的至少一种羟基芳族醛（b）和至少一种式（C）的羰基化合物（c）和（b）/（c）摩尔比 羟基芳族醛（b）/羰基化合物（c）的摩尔比为1/99〜99/1，缩聚物（d）的聚苯乙烯计算的重均分子量为600〜 图像＆gt; [A] [B] [C]（其中，R 1为碳数为1〜4的烷基，碳原子数为1〜4的烷氧基或羟基 ，R2为碳原子数为1〜4的烷基或碳原子数为1〜4的烷氧基，R3，R 4分别为氢原子，碳原子数为1〜4的烷基，芳基或芳烷基，l为0〜3的整数，m为0〜4的整数，n为 1〜5的整数，并且m和n的总数不大于5，条件是当l或m为至少2的整数时，多个R 1或R 2可以分别相同或不同）。

公开(公告)号：US5635329A

公开(公告)日：1997-06-03

申请号：US359822

申请日：1994-12-20

申请人： Mineo Nishi ,  Koji Nakano ,  Makoto Ikemoto

发明人： Mineo Nishi ,  Koji Nakano ,  Makoto Ikemoto

IPC分类号： G03F7/023

CPC分类号： G03F7/0236

摘要： A photosensitive resin composition comprising an alkali-soluble resin, a quinonediazide-type photosensitive compound and a solvent, wherein the alkali-soluble resin is a polycondensation product of 1 at least one phenolic compound (A) of the following formula (A) with 2 formaldehyde (a) and at least one carbonyl compound (b) of the following formula (B), in which the mixing ratio of the formaldehyde (a) to the carbonyl compound (b) is within a range of from 1/99 to 99/1 in terms of the molar ratio of (a)/(b), and the alkaline soluble resin has partial structures of the following formula (C), in which the weight ratio of repeating units (.beta.) wherein m is from 1 to 5, to repeating units (.alpha.) wherein m is 0, i.e. the weight ratio of (.beta.)/(.alpha.), is at most 0.25: ##STR1## wherein R.sup.1 is a group of the formula R.sup.2, OR.sup.3, COOR.sup.4 or CH.sub.2 COOR.sup.5, wherein R.sup.2 is a C.sub.1-4 alkyl group, each of R.sup.3, R.sup.4 and R.sup.5 which are independent of one another, is a hydrogen atom or a C.sub.1-4 alkyl group, n is an integer of from 0 to 3, provided that when n is 2 or 3, a plurality of R.sup.1 may be the same or different, each of R.sup.6 and R.sup.7 which are independent of each other, is a hydrogen atom, a C.sub.1-4 lower alkyl group, an aryl group or an aralkyl group, R.sup.8 is the same group as R.sup.1, R.sup.9 is the same group as R.sup.6, R.sup.10 is the same group as R.sup.7, p is the same integer as n, provided that R.sup.6 and R.sup.7, and R.sup.9 and R.sup.10, are not simultaneously hydrogen atoms, and m is an integer of from 0 to 5.

摘要翻译： 一种包含碱溶性树脂，醌二叠氮化物型光敏化合物和溶剂的感光性树脂组合物，其中碱溶性树脂是+ E，crc 1 + EE的缩聚产物，至少一种以下的酚类化合物（A） 式（A）与+ E，crc 2 + EE甲醛（a）和至少一种下式（B）的羰基化合物（b），其中甲醛（a）与羰基化合物（b ）在（a）/（b）的摩尔比为1/99〜99/1的范围内，碱溶性树脂具有下述式（C）的部分结构，其中重量比 重复单元（β），其中m为1至5，重复单元（α），其中m为0，即（β）/（α）的重量比为至多0.25：（A） （C）其中R 1是式R 2，OR 3，COOR 4或CH 2 COOR 5的基团，其中R 2是C 1-4烷基，R 3，R 4和R 5各自彼此独立地 ， 是氢原子或C 1-4烷基，n为0〜3的整数，条件是当n为2或3时，多个R 1可以相同或不同，R 6和R 7各自独立地 是氢原子，C1-4低级烷基，芳基或芳烷基，R8是与R1相同的基团，R9是与R6相同的基团，R10是与R7相同的基团，p 与n相同的整数，条件是R6和R7以及R9和R10不同时为氢原子，m为0-5的整数。

公开(公告)号：US5611850A

公开(公告)日：1997-03-18

申请号：US618307

申请日：1996-03-18

申请人： Mineo Nishi ,  Tadashi Teramoto

发明人： Mineo Nishi ,  Tadashi Teramoto

IPC分类号： G03F7/09 ,  C09D5/32 ,  C09D201/04 ,  G03L1/73 ,  G03L5/00

CPC分类号： G03F7/091

摘要： A composition for an anti-reflective coating on resist, which comprises a water-soluble fluorine compound and water as the main components, wherein the water-soluble fluorine compound contains (A) a water-soluble fluorine compound that is solid at 20.degree. C., 1 atmospheric pressure, and (B) a water-soluble fluorine compound that is liquid at 20.degree. C., 1 atmospheric pressure and that has a boiling point of at least 100.degree. C. under 1 atmospheric pressure.

摘要翻译： 一种抗蚀剂上的抗反射涂层组合物，其包含水溶性氟化合物和水作为主要成分，其中水溶性氟化合物含有（A）在20℃下为固体的水溶性氟化合物 1个大气压，和（B）在1个大气压下在20℃，1个大气压下沸点为至少100℃的水溶性氟化合物。

公开(公告)号：US5372909A

公开(公告)日：1994-12-13

申请号：US948422

申请日：1992-09-22

申请人： Mineo Nishi ,  Koji Nakano ,  Yoshihiro Takada

发明人： Mineo Nishi ,  Koji Nakano ,  Yoshihiro Takada

IPC分类号： G03F7/023 ,  G03F7/30

CPC分类号： G03F7/0236

摘要： A photosensitive resin composition comprising an alkali-soluble resin, a quinonediazide-type photosensitive compound and a solvent, as the main components, wherein the alkali-soluble resin is a polycondensation product of 1 at least one phenolic compound of the following formula (A) and 2 (a) formaldehyde and (b) at least one ketone or aldehyde of the following formula (B), and the mixing ratio of the formaldehyde (a) to the ketone or aldehyde (b) is within a range of from 1/99 to 99/1 in terms of the molar ratio of (a)/(b): ##STR1## wherein R.sup.1 is a group of the formula R.sup.2, OR.sup.3, COOR.sup.4 or CH.sub.2 COOR.sup.5 wherein R.sup.2 is a C.sub.1-4 alkyl group, each of R.sup.3, R.sup.4 and R.sup.5 which are independent of one another, is a hydrogen atom or a C.sub.1-4 alkyl group, n is an integer of from 0 to 3, provided that when n is 2 or 3, a plurality of R.sup.1 are the same or different, and each of R.sup.6 and R.sup.7 which are independent of each other, is a hydrogen atom, a C.sub.1-4 lower alkyl group, an aryl group or an aralkyl group, provided that R.sup.6 and R.sup.7 are not simultaneously hydrogen atoms.

摘要翻译： 一种包含碱溶性树脂，醌二叠氮化物型感光性化合物和溶剂作为主要成分的感光性树脂组合物，其中碱溶性树脂是+ E，crc / 1 /至少一种酚类化合物的缩聚产物 以下式（A）和+ E，crc / 2 /（a）甲醛和（b）至少一种下式（B）的酮或醛，以及甲醛（a）与酮的混合比或 醛（b）的摩尔比为（a）/（b）：式R2，OR3，COOR4或CH2COOR5的摩尔比为1/99〜99/1，其中R2为C1-4 烷基，R 3，R 4和R 5彼此独立地为氢原子或C 1-4烷基，n为0〜3的整数，条件是当n为2或3时，多个 R1相同或不同，R6和R7彼此独立的是氢原子，C1-4低级烷基，芳基或芳烷基，条件是R6和R7 不是同时是氢原子。

公开(公告)号：US5695906A

公开(公告)日：1997-12-09

申请号：US328775

申请日：1994-10-28

申请人： Mineo Nishi ,  Koji Nakano ,  Keisuke Nakano ,  Iwao Matsuo

发明人： Mineo Nishi ,  Koji Nakano ,  Keisuke Nakano ,  Iwao Matsuo

IPC分类号： G03F7/022 ,  G03F7/023

CPC分类号： G03F7/0236 ,  G03F7/022

摘要： A photosensitive resin composition comprising an alkali-soluble resin, a quinonediazide-type photosensitive compound and a solvent, wherein the photosensitive compound comprises 1 a quinonediazide sulfonate of a novolak resin (A) of the following formula (i) having a weight average molecular weight of from 600 to 2,200 or a novolak resin (B) of the following formula (ii) having a weight average molecular weight of from 600 to 2,200, and 2 a quinonediazide sulfonate of a hydroxybenzophenone (C) of the following formula (iii): ##STR1## wherein each of R.sup.1 and R.sup.4 is an alkyl group, R.sup.2 is an alkyl group or an aryl group, R.sup.3 is a hydrogen atom or an alkyl group, each of u and v is an integer of from 0 to 3, provided that when each of R.sup.1 to R.sup.4 is present in a plurality, the plurality of each of R.sup.1 to R.sup.4 may be the same or different, and each of k and l is a number of at least 0, provided that k:l=1:9 to 10:0; ##STR2## wherein R.sup.5 is a hydroxyl group or a alkyl group, each of R.sup.6 and R.sup.9 is a hydrogen atom, an alkyl group or an aryl group, each of R.sup.7 and R.sup.10 is a hydrogen atom or an alkyl group, R.sup.8 is an alkyl group, x is an integer of from 0 to 2, y is an integer of from 0 to 3, provided that when each of R.sup.5 to R.sup.10 is present in a plurality, the plurality of each of R.sup.5 to R.sup.10 may be the same or different, and each of m and n is a number of at least 0, provided that m:n=10:0 to 6:4; ##STR3## wherein each of p and q is an integer of at least 0, provided that 3.ltoreq.p+q.ltoreq.6.

摘要翻译： 包含碱溶性树脂，醌二叠氮化物型光敏化合物和溶剂的感光性树脂组合物，其中所述光敏化合物包含下列通式（i）的酚醛清漆树脂（A）的+ E，crc 1 + EE a醌二叠氮化物磺酸盐， 重均分子量为600〜2200，或重均分子量为600〜2200的下式（ⅱ）的酚醛清漆树脂（B）和+ E，crc 2 + EE a的醌二叠氮化物 （ⅲ）的羟基二苯甲酮（C）：其中R 1和R 4各自为烷基，R 2为烷基或芳基，R 3为氢原子或烷基，各自为 的u和v为0〜3的整数，条件是当R1至R4中的每一个以多个存在时，R 1至R 4中的每一个可以相同或不同，并且k和l各自为 数目至少为0，条件是k：l = 1：9至10：0; （ⅱ）其中R 5为羟基或烷基，R 6和R 9各自为氢原子，烷基或芳基，R 7和R 10各自为氢原子或烷基，R 8 是烷基，x是0〜2的整数，y是0〜3的整数，条件是当R5至R10各自存在时，R5至R10中的每一个可以是 相同或不同，并且m和n中的每一个是至少为0的数，条件是m：n = 10：0至6：4; （iii）其中p和q中的每一个是至少为0的整数，条件是3≤p+ q = 6。

公开(公告)号：US06756453B2

公开(公告)日：2004-06-29

申请号：US10178891

申请日：2002-06-25

申请人： Kouya Murai ,  Mineo Nishi ,  Masayuki Honda

发明人： Kouya Murai ,  Mineo Nishi ,  Masayuki Honda

IPC分类号： C08G5922

CPC分类号： C08G59/1405

摘要： The present invention relates to alicyclic epoxy compounds obtained by selectively hydrogenating aromatic rings of aromatic epoxy compounds in the presence of a hydrogenation catalyst, the concentration of the platinum group element in the product alicyclic epoxy compound being not more than 2 ppm.

摘要翻译： 本发明涉及通过在氢化催化剂存在下选择性氢化芳族环氧化合物的芳环得到的脂环式环氧化合物，产物脂环族环氧化合物中铂族元素的浓度不超过2ppm。