发明授权
- 专利标题: Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof
- 专利标题(中): 用于形成遮光膜的光敏树脂组合物,由其形成的黑色基质及其制备方法
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申请号: US759716申请日: 1996-12-06
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公开(公告)号: US5714286A公开(公告)日: 1998-02-03
- 发明人: Kiyoshi Uchikawa , Masaru Shida , Hiroshi Komano
- 申请人: Kiyoshi Uchikawa , Masaru Shida , Hiroshi Komano
- 申请人地址: JPX Kanagawa
- 专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX7-345613 19951209
- 主分类号: G02B5/20
- IPC分类号: G02B5/20 ; G02F1/1335 ; G03F7/004 ; G03F7/027 ; G03F7/028 ; G03F7/032 ; G03F7/038 ; G03F7/40 ; H01J9/227 ; H01J11/22 ; H01J11/34 ; H01J11/44 ; H01J17/04 ; G03F9/00
摘要:
A photosensitive resin composition for forming light shielding films is of particular utility in forming a black matrix for use in display elements such as of a CRT display, a liquid crystal panel, a plasma display and the like. The photosensitive resin composition is comprised of a photopolymerizable compound, a photopolymerization initiator, and light shielding materials composed of an oxide of copper and an oxide or oxides of at least one metal selected from iron, manganese, chromium, cobalt and nickel. The black matrix so obtained is conducive to high heat resistance, greatly light shielding and sharp image contrast as well as to excellent electrical insulation resistance. For use in the plasma display in particular, a black matrix is producible by coating of the photosensitive resin composition on a given substrate, followed by exposure of the coat to selective irradiation with active light rays to form a pattern therein and by subsequently burning of the pattern.
公开/授权文献
- US5224884A High current, low voltage drop, separable connector 公开/授权日:1993-07-06