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US5714286A Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof 失效
用于形成遮光膜的光敏树脂组合物,由其形成的黑色基质及其制备方法

Photosensitive resin composition for forming light shielding films,
black matrix formed by the same, and method for the production thereof
摘要:
A photosensitive resin composition for forming light shielding films is of particular utility in forming a black matrix for use in display elements such as of a CRT display, a liquid crystal panel, a plasma display and the like. The photosensitive resin composition is comprised of a photopolymerizable compound, a photopolymerization initiator, and light shielding materials composed of an oxide of copper and an oxide or oxides of at least one metal selected from iron, manganese, chromium, cobalt and nickel. The black matrix so obtained is conducive to high heat resistance, greatly light shielding and sharp image contrast as well as to excellent electrical insulation resistance. For use in the plasma display in particular, a black matrix is producible by coating of the photosensitive resin composition on a given substrate, followed by exposure of the coat to selective irradiation with active light rays to form a pattern therein and by subsequently burning of the pattern.
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