发明授权
- 专利标题: Water-developable photosensitive resin composition
- 专利标题(中): 水显影感光树脂组合物
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申请号: US904267申请日: 1997-07-31
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公开(公告)号: US5837421A公开(公告)日: 1998-11-17
- 发明人: Kazunori Kanda , Koichi Ueda , Tadahiro Kakiuchi , Hisaichi Muramoto , Kenji Yasuda , Hozumi Sato , Katsuo Koshimura , Takashi Nishioka
- 申请人: Kazunori Kanda , Koichi Ueda , Tadahiro Kakiuchi , Hisaichi Muramoto , Kenji Yasuda , Hozumi Sato , Katsuo Koshimura , Takashi Nishioka
- 申请人地址: JPX Osaka-fu JPX Tokyo-to
- 专利权人: Nippon Paint Co., Ltd.,Japan Synthetic Rubber Co., Ltd.
- 当前专利权人: Nippon Paint Co., Ltd.,Japan Synthetic Rubber Co., Ltd.
- 当前专利权人地址: JPX Osaka-fu JPX Tokyo-to
- 优先权: JPX6-306212 19941209
- 主分类号: G03F7/027
- IPC分类号: G03F7/027 ; G03F7/00 ; G03F7/028 ; G03F7/033 ; G03F7/32 ; G03C1/725
摘要:
A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises: (1) a granular copolymer produced by polymerizing a monomer mixture comprising: (i) an aliphatic conjugated diene monomer; (ii) a monomer expressed by the general formula (I): ##STR1## (in which R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents an alkylene group having a carbon number of 3 to 20, and l represents an integer of 1 to 20); (iii) a monomer having at least two addition-polymerizable groups, and (iv) an addition-polymerizable monomer other than (i), (ii) and (iii), if desirable; (2) a photo-polymerizable unsaturated monomer; (3) an amino group-containing compound, and (4) a photo-polymerization initiator.
公开/授权文献
- USD300696S Chair 公开/授权日:1989-04-18
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