利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

21 条记录 (耗时 0.032 秒)

    Water-developable photosensitive resin composition
    2.
    发明授权
    Water-developable photosensitive resin composition 失效
    水显影感光树脂组合物

    公开(公告)号：US5837421A

    公开(公告)日：1998-11-17

    申请号：US904267

    申请日：1997-07-31

    申请人： Kazunori Kanda ,  Koichi Ueda ,  Tadahiro Kakiuchi ,  Hisaichi Muramoto ,  Kenji Yasuda ,  Hozumi Sato ,  Katsuo Koshimura ,  Takashi Nishioka

    发明人： Kazunori Kanda ,  Koichi Ueda ,  Tadahiro Kakiuchi ,  Hisaichi Muramoto ,  Kenji Yasuda ,  Hozumi Sato ,  Katsuo Koshimura ,  Takashi Nishioka

    IPC分类号： G03F7/027 ,  G03F7/00 ,  G03F7/028 ,  G03F7/033 ,  G03F7/32 ,  G03C1/725

    CPC分类号： G03F7/033

    摘要： A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises: (1) a granular copolymer produced by polymerizing a monomer mixture comprising: (i) an aliphatic conjugated diene monomer; (ii) a monomer expressed by the general formula (I): ##STR1## (in which R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents an alkylene group having a carbon number of 3 to 20, and l represents an integer of 1 to 20); (iii) a monomer having at least two addition-polymerizable groups, and (iv) an addition-polymerizable monomer other than (i), (ii) and (iii), if desirable; (2) a photo-polymerizable unsaturated monomer; (3) an amino group-containing compound, and (4) a photo-polymerization initiator.

    摘要翻译： 提供一种感光性树脂组合物，其具有优异的水显影性，冲击弹性，曝光后的树脂板强度，断裂伸长和树脂板透明度。 组合物包括：（1）通过聚合单体混合物制备的颗粒共聚物，其包含：（i）脂族共轭二烯单体; （ii）由通式（I）表示的单体：n原子或甲基，R 2表示碳原子数3〜20的亚烷基，l表示1〜20的整数）表示的单体。 （iii）具有至少两个可加成聚合基团的单体，和（iv）除（i），（ii）和（iii）之外的可加成聚合单体，如果需要; （2）光聚合性不饱和单体; （3）含氨基化合物，（4）光聚合引发剂。

    Water developable photosensitive resin composition
    5.
    发明授权
    Water developable photosensitive resin composition 失效
    水可显影光敏树脂组合物

    公开(公告)号：US5736298A

    公开(公告)日：1998-04-07

    申请号：US536494

    申请日：1995-10-02

    申请人： Katsuo Koshimura ,  Takayoshi Tanabe ,  Hozumi Sato ,  Noboru Ohshima ,  Takashi Nishioka

    发明人： Katsuo Koshimura ,  Takayoshi Tanabe ,  Hozumi Sato ,  Noboru Ohshima ,  Takashi Nishioka

    IPC分类号： G03F7/027 ,  G03F7/033 ,  G03C1/73

    CPC分类号： G03F7/027 ,  G03F7/033

    摘要： A photo-sensitive resin composition is provided which contains (1) a particulate polymer of a carboxy-group-containing-diene having a cross-linked structure; (2) a polymer having two or more photo-polymerizable unsaturated groups at its molecular chain terminals, and, optionally, a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or (2') a non-diene-type polymer having a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or a low molecular weight linear diene-type polymer; (3) a photo-polymerizable unsaturated monomer; (4) a polymer containing an amino group; and (5) a photo-polymerization initiator. The photo-sensitive resin composition has excellent water-developing capability and shows almost no swelling in water, causing minimal reduction in strength and only minimal dimensional changes during development. Resin plates prepared from the composition possess excellent strength after exposure to light, excellent elongation at break, impact resilience and superb transparency, providing a good characteristic balance of properties.

    摘要翻译： 提供了一种光敏树脂组合物，其包含（1）具有交联结构的含羧基的二烯的颗粒状聚合物; （2）在其分子链末端具有两个以上的光聚合性不饱和基团的聚合物，以及任选的侧链中的光聚合性不饱和基团，羧基，羟基，氨基或环氧基，或（2 '）侧链中具有光聚合性不饱和基团，羧基，羟基，氨基或环氧基的非二烯类聚合物，或低分子线型二烯类聚合物; （3）光聚合性不饱和单体; （4）含有氨基的聚合物; 和（5）光聚合引发剂。 感光树脂组合物具有优异的水显影能力，并且在水中几乎没有溶胀，在显影期间几乎不降低强度并且只有极小的尺寸变化。 由组合物制备的树脂板在曝光后具有优异的强度，优异的断裂伸长率，抗冲击弹性和极好的透明度，提供良好的性能特征平衡。

    Olefin polymer, process for manufacturing the same, curable resin composition, and antireflection coating
    7.
    发明授权
    Olefin polymer, process for manufacturing the same, curable resin composition, and antireflection coating 有权
    烯烃聚合物，其制造方法，可固化树脂组合物和抗反射涂层

    公开(公告)号：US06271326B1

    公开(公告)日：2001-08-07

    申请号：US09299660

    申请日：1999-04-27

    申请人： Akira Nishikawa ,  Fusaka Watanabe ,  Yuichi Hashiguchi ,  Hozumi Sato

    发明人： Akira Nishikawa ,  Fusaka Watanabe ,  Yuichi Hashiguchi ,  Hozumi Sato

    IPC分类号： C08F1424

    CPC分类号： C08F293/00 ,  C08F283/12 ,  C08G77/442

    摘要： An olefin polymer and a curable resin composition which can form cure coatings with excellent transparency, low reflectance, and high scratch resistance, an antireflection film exhibiting excellent transparency, low reflectance, and high scratch resistance are disclosed. The olefin polymer comprises a polysiloxane segment in the main chain, has 30 wt % or more fluorine content, and has a polystyrene-reduced number average molecular weight of 5,000 or more. The curable resin composition comprises the olefin polymer. The antireflection film is made from the cured product of the curable resin composition.

    摘要翻译： 公开了能够形成透明性好，低反射率，高耐划伤性的固化涂料的烯烃聚合物和固化性树脂组合物，具有优异的透明性，低反射率，高耐擦伤性的抗反射膜。 烯烃聚合物包含主链中的聚硅氧烷链段，具有30重量％以上的氟含量，聚苯乙烯换算的数均分子量为5000以上。 可固化树脂组合物包含烯烃聚合物。 防反射膜由可固化树脂组合物的固化产物制成。

    Rubber composition comprising a thermosetting resin and a functional rubber-like copolymer
    9.
    发明授权
    Rubber composition comprising a thermosetting resin and a functional rubber-like copolymer 失效
    包含热固性树脂和功能橡胶状共聚物的橡胶组合物

    公开(公告)号：US4599382A

    公开(公告)日：1986-07-08

    申请号：US714032

    申请日：1985-03-20

    申请人： Hozumi Sato ,  Shin-ichiro Iwanaga ,  Hiroji Enyo ,  Yasuhiko Takemura ,  Yoshiaki Kawamura

    发明人： Hozumi Sato ,  Shin-ichiro Iwanaga ,  Hiroji Enyo ,  Yasuhiko Takemura ,  Yoshiaki Kawamura

    IPC分类号： C08F236/04 ,  C08L19/00 ,  C08L33/06 ,  C08L61/00 ,  C08L61/10

    CPC分类号： C08L19/006 ,  C08F236/04 ,  C08L33/062 ,  C08L61/00 ,  C08L61/06 ,  C08L61/24 ,  C08L61/28

    摘要： A rubber composition consisting essentially of 5-99 parts by weight of a thermosetting resin and 94-1 parts by weight of one of the following functional rubber-like copolymers (I) to (III) having a Mooney viscosity ML.sub.1+4.sup.100 of 20-120:(I) a functional rubber-like copolymer consisting of 1-20% by weight of a monomer having epoxy groups, hydroxyl groups or amino groups, 15-50% by weight of acrylonitrile and 40-80% by weight of butadiene and/or isoprene as monomer units constituting the polymer,(II) a functional rubber-like copolymer consisting of 1-20% by weight of a monomer having epoxy groups, hydroxyl groups or amino groups, 40-99% by weight of an alkyl (meth)acrylate and/or an alkoxyalkyl (meth)acrylate and 0-30% by weight of monomers copolymerizable therewith other than butadiene and isoprene, as the monomer units constituting the polymer, and(III) a functional rubber-like copolymer consisting of 1-20% by weight of a monomer having epoxy groups, hydroxyl groups or amino groups, 15-50% by weight of acrylonitrile, 20-60% by weight of butadiene and/or isoprene and 5-65% by weight of an alkyl (meth)acrylate and/or an alkoxy (meth)acrylate as the monomer units constituting the polymer.Said functional rubber copolymer may include 10% by weight or less of a polyfunctional monomer as a monomer unit constituting the polymer. In this case, the ratio of the thermosetting resin to the functional rubber-like copolymer is 50-99 parts by weight of the former to 1-50 parts by weight of the latter.

    摘要翻译： 基本上由5-99重量份的热固性树脂和94-1重量份具有门尼粘度ML1 + 4100为20〜20的功能性橡胶状共聚物（I）〜（III）之一组成的橡胶组合物， 120：（I）由1-20重量％的具有环氧基，羟基或氨基的单体，15-50重量％的丙烯腈和40-80重量％的丁二烯组成的功能性橡胶状共聚物，以及 /或异戊二烯作为构成聚合物的单体单元，（II）由1-20重量％的具有环氧基，羟基或氨基的单体组成的官能橡胶状共聚物，40-99重量％的烷基（ （甲基）丙烯酸酯和/或（甲基）丙烯酸烷氧基烷基酯和0-30重量％的除丁二烯和异戊二烯之外可共聚的单体作为构成聚合物的单体单元，和（III）由1 -20重量％的具有环氧基，羟基或氨基的单体，15 -50重量％的丙烯腈，20-60重量％的丁二烯和/或异戊二烯和5-65重量％的（甲基）丙烯酸烷基酯和/或烷氧基（甲基）丙烯酸酯作为构成聚合物的单体单元 。 所述功能橡胶共聚物可以包含10重量％以下的作为构成聚合物的单体单元的多官能单体。 在这种情况下，热固性树脂与官能橡胶状共聚物的比例为前者的50-99重量份，后者的1-50重量份。

    Negative photoresist stripping liquid composition
    10.
    发明授权
    Negative photoresist stripping liquid composition 失效
    负光致抗蚀剂剥离液组成

    公开(公告)号：US6040117A

    公开(公告)日：2000-03-21

    申请号：US28290

    申请日：1998-02-24

    申请人： Toshiyuki Ota ,  Kimiyasu Sano ,  Hideaki Tashiro ,  Hozumi Sato

    发明人： Toshiyuki Ota ,  Kimiyasu Sano ,  Hideaki Tashiro ,  Hozumi Sato

    IPC分类号： G03F7/42

    CPC分类号： G03F7/426

    摘要： A negative photoresist stripping liquid composition is provided which comprises from 30 to 75% by weight of dimethyl sulfoxide, from 20 to 65% by weight of 1,3-dimethyl-2-imidazolidinone, from 0.1 to 5% by weight of a tetraalkylammonium hydroxide and from 0.5 to 15% by weight of water. The composition has a superior stripping performance especially against photoresists that are alkali-developable and can form films of at least 20 .mu.m in thickness, and has no problem of freezing even when stored outdoors in the winter. The composition is useful for the stripping of negative photoresists for bump formation and for fabricating circuit substrates.

    摘要翻译： 提供了一种负性光致抗蚀剂剥离液体组合物，其包含30至75重量％的二甲基亚砜，20至65重量％的1,3-二甲基-2-咪唑啉酮，0.1至5重量％的四烷基氢氧化铵 和0.5至15重量％的水。 该组合物具有优异的剥离性能，特别是对于可碱显影的光致抗蚀剂，并且可以形成厚度至少为20μm的膜，并且即使在冬季储存在户外时也不存在冷冻问题。 该组合物可用于剥离阴极光致抗蚀剂用于凸块形成和用于制造电路基板。