发明授权
- 专利标题: Measurement system and measurement method
- 专利标题(中): 测量系统和测量方法
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申请号: US857360申请日: 1997-05-15
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公开(公告)号: US5851842A公开(公告)日: 1998-12-22
- 发明人: Ryota Katsumata , Nobuo Hayasaka , Naoki Yasuda , Hideshi Miyajima , Iwao Higashikawa , Masaki Hotta
- 申请人: Ryota Katsumata , Nobuo Hayasaka , Naoki Yasuda , Hideshi Miyajima , Iwao Higashikawa , Masaki Hotta
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX8-121918 19960516; JPX9-065147 19970318
- 主分类号: G01R15/22
- IPC分类号: G01R15/22 ; C23C16/50 ; C23C16/52 ; G01B11/06 ; G01J5/00 ; G01J5/58 ; G01N21/27 ; G01N21/35 ; G01N21/3563 ; G01N27/60 ; H01J37/32 ; H01L21/302 ; H01L21/3065 ; H01L21/31 ; H01L21/66 ; H05H1/46 ; H01L21/00
摘要:
The measurement system comprises a holder for holding a dielectric film formed on at least a semiconductive substrate and sandwiched between the substrate and a conductive film, voltage application terminals for applying voltage between the substrate and the conductive film, variable voltage source for supplying the voltage to the voltage application terminals, a light source for irradiating the dielectric film with light including wavelength of an infrared region and transmitting the light through the dielectric film, light absorbance detector receiving the light transmitted through the dielectric film, for detecting absorbance of an absorbed light component in an absorption wavelength region intrinsic to the dielectric film, and a potential difference measurement unit for measuring a potential difference between the substrate and the conductive film of the dielectric film on the basis of change in absorbance of the light component when the voltage is changed by the variable voltage source.
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