发明授权
- 专利标题: Method of stress testing memory integrated circuits
- 专利标题(中): 记忆体集成电路应力测试方法
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申请号: US663515申请日: 1996-06-13
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公开(公告)号: US5852581A公开(公告)日: 1998-12-22
- 发明人: Ray Beffa , Leland R. Nevill , Warren M. Farnworth , Eugene H. Cloud , William K. Waller
- 申请人: Ray Beffa , Leland R. Nevill , Warren M. Farnworth , Eugene H. Cloud , William K. Waller
- 申请人地址: ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: ID Boise
- 主分类号: G11C29/50
- IPC分类号: G11C29/50 ; G11C29/56 ; G11C7/00
摘要:
A memory self-stress mode capable of use during wafer burn-in such as for dynamic random access memory (DRAM) integrated circuits. A burn-in power supply voltage and ground voltage delivered to a common node of a plurality of memory cell storage capacitors and to an equilibrate node coupled to bit lines. An all row high test cycles word lines between a binary low logic level and a binary high logic level, thereby stressing the dielectric of the memory cell storage capacitors by imposing stress voltages of differing polarity. A half row high test cycles alternate word lines of a word line sequence thereby stressing undesired short circuit connections between adjacent word lines.
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