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US5856561A Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions 失效
双酚羧酸叔酯衍生物和化学放大正型抗蚀剂组合物

Bisphenol carboxylic acid tertiary ester derivatives and chemically
amplified positive resist compositions
摘要:
Novel bisphenol carboxylic acid tertiary ester derivatives having two aromatic ether groups and an ester group which are all replaced by acid labile groups are provided. The derivatives are used as a dissolution inhibitor in a chemically amplified positive resist composition comprising an organic solvent, an alkali soluble resin, and a photo-acid generator. Since the dissolution inhibitor has a highly reactive acetal group as an acid labile group, its coupling-off rapidly takes place after exposure. The dissolution inhibitor itself is less alkali soluble and its acid decomposition product is a phenol derivative having a carboxylic acid group with high alkali solubility, leading to a high dissolution contrast.
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