发明授权
US5885356A Method of reducing residue accumulation in CVD chamber using ceramic
lining
失效
使用陶瓷衬里减少CVD室中残留物累积的方法
- 专利标题: Method of reducing residue accumulation in CVD chamber using ceramic lining
- 专利标题(中): 使用陶瓷衬里减少CVD室中残留物累积的方法
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申请号: US577862申请日: 1995-12-22
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公开(公告)号: US5885356A公开(公告)日: 1999-03-23
- 发明人: Jun Zhao , Tom Cho , Xin Sheng Guo , Atsushi Tabata , Jianmin Qiao , Alex Schreiber
- 申请人: Jun Zhao , Tom Cho , Xin Sheng Guo , Atsushi Tabata , Jianmin Qiao , Alex Schreiber
- 申请人地址: CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: CA Santa Clara
- 主分类号: C23C16/44
- IPC分类号: C23C16/44 ; C23C16/455 ; C23C16/458 ; C23C16/50 ; C30B25/02 ; H01J37/32 ; H01L21/205 ; H01L21/31 ; H01L21/687 ; C23C16/00 ; B44C1/22
摘要:
The present invention provides a method and apparatus for limiting residue build-up by lining with a ceramic material the exhaust plenun and exhaust manifold of a processing chamber. In another aspect of the invention, the inventors have used an air gap between the ceramic liner and the processing chamber walls to increase the dielectric value of the ceramic liner, and further inhibit the build-up of residues. In another aspect, the ceramic liner has been found to retain sufficient heat to allow the elimination of heaters typically used to heat the aluminum walls during a clean operation, if the clean operation is commenced immediately after a process step so that the ceramic retains the necessary heat from the previous processing step. The provision of an air gap aids in this heating, preventing the ceramic heat from being drawn off by direct contact with the aluminum walls. In a preferred embodiment, the ceramic liners are attached to the chamber walls with TEFLON.RTM. (polytetrafluoroethylene) screws.
公开/授权文献
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