发明授权
- 专利标题: Apparatus for adjusting initial position of melt surface
- 专利标题(中): 用于调节熔体表面初始位置的装置
-
申请号: US760963申请日: 1996-12-05
-
公开(公告)号: US5888299A公开(公告)日: 1999-03-30
- 发明人: Masahiko Urano , Atsushi Ozaki , Tomohiro Kakegawa , Hideki Nakano
- 申请人: Masahiko Urano , Atsushi Ozaki , Tomohiro Kakegawa , Hideki Nakano
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX7-351274 19951227
- 主分类号: C30B15/20
- IPC分类号: C30B15/20 ; C30B15/26 ; C30B35/00
摘要:
An apparatus and a method capable of automatically adjusting an initial position of the surface of a melt without an operator are provided. In a single crystal puller using a wire as a suspender for a seed crystal for growing a single crystal of silicon or the like according to the CZ method, a reference position of the seed crystal is detected, the wire is unwound to lower the end of the wire to a position higher by a distance W-X from the reference position and then pulled upward above said reference position to correct the wire for an extension due to the weight of a single crystal attached thereto. Also, the wire is left above a melt for about ten minutes to provide a constant amount of extension to the wire due to heat of the melt These operations are automatically performed.
公开/授权文献
- US4077501A Disc for disc brake unit 公开/授权日:1978-03-07
信息查询
IPC分类: