发明授权
US5889059A Phenylacetic acid derivatives, preparation thereof and intermediates
therefor, and compositions containing them
失效
苯乙酸衍生物,其制备方法及其中间体,以及含有它们的组合物
- 专利标题: Phenylacetic acid derivatives, preparation thereof and intermediates therefor, and compositions containing them
- 专利标题(中): 苯乙酸衍生物,其制备方法及其中间体,以及含有它们的组合物
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申请号: US687480申请日: 1996-08-05
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公开(公告)号: US5889059A公开(公告)日: 1999-03-30
- 发明人: Herbert Bayer , Hubert Sauter , Ruth Muller , Wassilios Grammenos , Albrecht Harreus , Reinhard Kirstgen , Franz Rohl , Eberhard Ammermann , Gisela Lorenz
- 申请人: Herbert Bayer , Hubert Sauter , Ruth Muller , Wassilios Grammenos , Albrecht Harreus , Reinhard Kirstgen , Franz Rohl , Eberhard Ammermann , Gisela Lorenz
- 申请人地址: DEX Ludwigshafen
- 专利权人: BASF Aktiengesellschaft
- 当前专利权人: BASF Aktiengesellschaft
- 当前专利权人地址: DEX Ludwigshafen
- 优先权: DEX4403448.2 19940204; DEX4421182.1 19940617
- 主分类号: C07D249/08
- IPC分类号: C07D249/08 ; A01N37/50 ; A01N37/52 ; A01N43/06 ; A01N43/36 ; A01N43/40 ; A01N43/54 ; A01N43/80 ; A01N43/82 ; A01N43/824 ; A01P3/00 ; A01P7/04 ; C07C251/38 ; C07C251/40 ; C07C251/48 ; C07C251/54 ; C07C251/56 ; C07C251/58 ; C07C255/11 ; C07C327/44 ; C07C327/48 ; C07C327/58 ; C07D207/32 ; C07D207/333 ; C07D207/36 ; C07D213/30 ; C07D213/53 ; C07D213/62 ; C07D213/64 ; C07D213/79 ; C07D233/64 ; C07D237/14 ; C07D239/34 ; C07D239/46 ; C07D241/18 ; C07D261/08 ; C07D261/10 ; C07D263/32 ; C07D263/34 ; C07D271/06 ; C07D271/10 ; C07D277/24 ; C07D307/42 ; C07D333/32 ; C07D521/00 ; A01N37/18 ; C07C233/05
摘要:
Phenylacetic acid derivatives of the formula I ##STR1## where the substituents and the index have the following meanings: X is oxygen or sulfur;R is hydrogen or alkyl;R.sup.1 is hydrogen or alkyl;R.sup.2 is cyano, nitro, trifluoromethyl, halogen, alkyl or alkoxy;m is 0, 1 or 2, it being possible for the R.sup.2 radicals to be different if m is 2;R.sup.3 is hydrogen, cyano, nitro, hydroxyl, amino, halogen, alkyl, haloalkyl, alkoxy, haloalkoxy, alkylthio, alkylamino or dialkylamino;R.sub.4 is hydrogen, cyano, nitro, hydroxyl, amino, halogen,unsubstituted or substituted alkyl, alkoxy, alkylthio, alkylamino, dialkylamino, alkenyl, alkenyloxy, alkenylthio, alkenylamino, N-alkenyl-N-alkylamino, alkynyl, alkynyloxy, alkynylthio, alkynylamino, N-alkynyl-N-alkylamino;unsubstituted or substituted cycloalkyl, cycloalkoxy, cycloalkylthio, cycloalkylamino, N-cycloalkyl-N-alkylamino, cycloalkenyl, cycloalkenyloxy, cycloalkenylthio, cycloalkenylamino, N-cycloalkenyl-N-alkylamino, heterocyclyl, heterocyclyloxcy, heterocyclylthio, heterocyclylamino, N-heterocyclyl-N-alkylamino, aryl, aryloxy, arylthio, arylamino, N-aryl-N-alkylamino, hetaryl, hetaryloxy, hetarylthio, hetarylamino, N-hetaryl-N-alkylamino;R.sup.5 is hydrogen,unsubstituted or substituted alkyl, cycloalkyl, alkenyl, alkynyl, alkylcarbonyl, alkenylcarbonyl, alkynylcarbonyl or alkylsulfonyl;unsubstituted or substituted aryl, arylcarbonyl, arylsulfonyl, hetaryl, hetarylcarbonyl or hetarylsulfonyl,and their salts, processes and intermediates for their preparation, and their use are described.