发明授权
US5895586A Plasma processing apparatus and plasma processing method in which a part
of the processing chamber is formed using a pre-fluorinated material of
aluminum
失效
等离子体处理装置和等离子体处理方法，其中使用铝的预氟化材料形成处理室的一部分
- 专利标题： Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum
- 专利标题（中）： 等离子体处理装置和等离子体处理方法，其中使用铝的预氟化材料形成处理室的一部分
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申请号： US737520申请日： 1996-11-12
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公开(公告)号： US5895586A公开(公告)日： 1999-04-20
- 发明人: Tetsunori Kaji , Saburo Kanai , Satoshi Ito , Ryoji Hamasaki , Tetsuo Ono , Tatehito Usui , Kazue Takahashi , Kazutami Tago
- 申请人： Tetsunori Kaji , Saburo Kanai , Satoshi Ito , Ryoji Hamasaki , Tetsuo Ono , Tatehito Usui , Kazue Takahashi , Kazutami Tago
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX6-102453 19940517
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; B23K10/00
摘要：
There are provided a plasma processing apparatus and a plasma processing method which are suitable for processing a processed substance using a gas plasma containing fluorine atoms.Structural materials used for a high vacuum processing chamber of a plasma processing apparatus are aluminum, aluminum having an anodic oxide coating processed surface and a material having a film of aluminum oxide or a film having aluminum oxide as a main component. A part or the whole of the inner surfaces of the processing chamber is constructed with a pre-fluorinated material.When plasma processing of a processed substance is performed using a gas plasma containing fluorine atoms in the processing chamber having the pre-fluorinated inner surfaces, time-varying processing characteristic can be suppressed.
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