公开(公告)号：US5895586A

公开(公告)日：1999-04-20

申请号：US737520

申请日：1996-11-12

申请人： Tetsunori Kaji ,  Saburo Kanai ,  Satoshi Ito ,  Ryoji Hamasaki ,  Tetsuo Ono ,  Tatehito Usui ,  Kazue Takahashi ,  Kazutami Tago

发明人： Tetsunori Kaji ,  Saburo Kanai ,  Satoshi Ito ,  Ryoji Hamasaki ,  Tetsuo Ono ,  Tatehito Usui ,  Kazue Takahashi ,  Kazutami Tago

IPC分类号： H01J37/32 ,  B23K10/00

CPC分类号： H01J37/32467 ,  H01J37/32477 ,  Y10S156/914

摘要： There are provided a plasma processing apparatus and a plasma processing method which are suitable for processing a processed substance using a gas plasma containing fluorine atoms.Structural materials used for a high vacuum processing chamber of a plasma processing apparatus are aluminum, aluminum having an anodic oxide coating processed surface and a material having a film of aluminum oxide or a film having aluminum oxide as a main component. A part or the whole of the inner surfaces of the processing chamber is constructed with a pre-fluorinated material.When plasma processing of a processed substance is performed using a gas plasma containing fluorine atoms in the processing chamber having the pre-fluorinated inner surfaces, time-varying processing characteristic can be suppressed.

摘要翻译： PCT No.PCT / JP95 / 00935 Sec。 371日期：1996年11月12日 102（e）日期1996年11月12日PCT提交1995年5月17日PCT公布。 出版物WO95 / 31822 日期：1995年11月23日提供了适用于使用含有氟原子的气体等离子体处理物质的等离子体处理装置和等离子体处理方法。 用于等离子体处理装置的高真空处理室的结构材料是具有阳极氧化物涂覆处理表面的铝，具有氧化铝膜或具有氧化铝作为主要成分的膜的材料。 处理室的内表面的一部分或全部由预氟化材料构成。 使用具有预氟化内表面的处理室中含有氟原子的气体等离子体进行处理物质的等离子体处理时，可以抑制时变处理特性。

公开(公告)号：US20090289035A1

公开(公告)日：2009-11-26

申请号：US12534491

申请日：2009-08-03

申请人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

发明人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

IPC分类号： H01L21/3065 ,  C23C16/513

CPC分类号： H01J37/32504 ,  H01J37/32522 ,  H01J2237/022 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831

摘要： A plasma processing apparatus and method which includes a vacuum processing chamber, a plasma generating unit, a process gas supply unit, a specimen table, and a vacuum pumping unit. The specimen table includes an electrostatic arrangement for holding a specimen on a holding surface of the specimen table by electrostatic force, a specimen table cover arranged around the specimen table, and first and second heat transfer gas supply units. The first heat transfer gas supply unit has a main path for supplying a heat transfer gas to the specimen holding surface for cooling the specimen, and the second heat transfer gas supply unit has a branch path branched from the main path of the first heat transfer gas supply unit for supplying a part of the heat transfer gas to a gap between an outer portion of the specimen holding surface and the specimen table cover.

摘要翻译： 一种等离子体处理装置和方法，其包括真空处理室，等离子体产生单元，处理气体供应单元，样品台和真空泵送单元。 样本台包括用于通过静电力将样本保持在样品台的保持表面上的静电装置，设置在样本台周围的样本台盖以及第一和第二传热气体供应单元。 第一传热气体供给单元具有用于向试样保持面供给传热气体以冷却试样的主路径，第二传热气体供给单元具有从第一传热气体的主路径分支的分支路径 供应单元，用于将一部分传热气体供应到样品保持表面的外部与样品台盖之间的间隙。

公开(公告)号：US07208422B2

公开(公告)日：2007-04-24

申请号：US10953537

申请日：2004-09-30

申请人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

发明人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

IPC分类号： H01L21/302

CPC分类号： H01J37/32504 ,  H01J37/32522 ,  H01J2237/022 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831

摘要： A plasma processing method utilizing a plasma processing apparatus having a plasma generating unit, a process chamber including an outer cylinder for withstanding a reduced pressure, and an inner cylinder made of non-magnetic material and being replaceable arranged inside the outer cylinder, a process gas supply unit for supplying gas to the process chamber, a specimen table for holding a specimen and a vacuum pumping unit. A temperature of the inner cylinder is monitored, and a desired inner cylinder temperature which is inputted in advance in response to a processing condition of the specimen is compared with the monitored temperature of the inner cylinder. A temperature of the outer cylinder is controlled in response to a result of the comparison so as to control the inner cylinder temperature to a predetermined value.

摘要翻译： 一种利用等离子体处理装置的等离子体处理方法，该等离子体处理装置具有等离子体发生单元，具有用于承受减压的外筒的处理室，以及由非磁性材料制成的可更换的内筒， 用于向处理室供给气体的供给单元，用于保持试样的试样台和真空泵送单元。 监测内筒的温度，并将根据试样的加工条件预先输入的期望的内筒温度与内筒的监测温度进行比较。 响应于比较的结果来控制外筒的温度，以将内筒温度控制到预定值。

公开(公告)号：US5874012A

公开(公告)日：1999-02-23

申请号：US611758

申请日：1996-03-08

申请人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

发明人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

IPC分类号： C30B25/10 ,  C23F4/00 ,  C30B25/16 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  B44C1/22 ,  C23C16/00 ,  C23F1/02

CPC分类号： H01J37/32504 ,  H01J37/32522 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831 ,  H01J2237/022

摘要： A plasma processing apparatus is provided. In the apparatus, an inside surface of a process chamber is prevented from having its quality varied or becoming a heavy metal contamination source by plasma in the chamber, and at the same time the plasma characteristic is stabilized over time. In a plasma processing apparatus including a plasma generating unit, a process chamber capable of having its inside pressure reduced, a gas supply system for supplying a gas to the process chamber, a sample table for holding a sample and a vacuum pumping system, the process chamber has an outer cylinder capable of withstanding depressurization and an inner cylinder arranged inside the outer cylinder and being spaced therefrom through a gap, and a heater and a temperature control are provided in the outer cylinder. A non-magnetic metallic material not containing heavy metals, or ceramic, carbon, silicon or quartz is used for the inner cylinder. The temperature of the inner cylinder is controlled to a desired value by heating the outer cylinder using the heater and the temperature control. By controlling the temperature of the inner cylinder to, for example, 100.degree. C. to 350.degree. C., the surface temperature of the inner cylinder can be maintained at a desired value.

摘要翻译： 提供了一种等离子体处理装置。 在该装置中，通过室内的等离子体防止了处理室的内表面的质量变化或变成重金属污染源，同时等离子体特性随时间稳定。 在包括等离子体发生单元的等离子体处理装置中，能够使其内部压力降低的处理室，用于向处理室供给气体的气体供给系统，用于保持样品的样品台和真空泵送系统，该方法 腔室具有能够承受减压的外筒和布置在外筒内部并通过间隙与其间隔开的内筒，并且在外筒中设置加热器和温度控制。 内筒使用不含重金属或陶瓷，碳，硅或石英的非磁性金属材料。 通过使用加热器和温度控制加热外筒来将内筒的温度控制到期望值。 通过将内筒的温度控制在例如100〜350℃，能够将内筒的表面温度保持在期望值。

公开(公告)号：US20100140224A1

公开(公告)日：2010-06-10

申请号：US12709641

申请日：2010-02-22

申请人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

发明人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

IPC分类号： B44C1/22 ,  C23F1/08

CPC分类号： H01J37/32504 ,  H01J37/32522 ,  H01J2237/022 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831

摘要： A plasma processing apparatus and method which includes a vacuum processing chamber, a plasma generating unit, a process gas supply unit, a specimen table, and a vacuum pumping unit. The specimen table includes an electrostatic arrangement for holding a specimen on a holding surface of the specimen table, a specimen table cover made of an insulator arranged around the specimen table, and first and second heat transfer gas supply units. The first heat transfer gas supply unit has a main path for supplying a heat transfer gas to the specimen holding surface, and the second heat transfer gas supply unit has a branch path branched from the main path of the first heat transfer gas supply unit for directly supplying a part of the heat transfer gas to a gap between an outer portion of the specimen holding surface and the specimen table cover for cooling the specimen table cover.

摘要翻译： 一种等离子体处理装置和方法，其包括真空处理室，等离子体产生单元，处理气体供应单元，样品台和真空泵送单元。 样本台包括用于将样本保持在样本台的保持表面上的静电布置，由布置在样本台周围的绝缘体制成的样本台盖以及第一和第二传热气体供应单元。 第一传热气体供给单元具有用于向试样保持面供给传热气体的主路径，第二传热气体供给单元具有从第一传热气体供给单元的主路径分支直接分支的分支路径 将一部分传热气体供应到样品保持表面的外部与样品台盖之间的间隙，以冷却样品台盖。

公开(公告)号：US07565879B2

公开(公告)日：2009-07-28

申请号：US10953539

申请日：2004-09-30

申请人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

发明人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

IPC分类号： C23C16/511 ,  C23C16/52 ,  C23C16/22 ,  C23C16/06

CPC分类号： H01J37/32504 ,  H01J37/32522 ,  H01J2237/022 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831

摘要： A plasma processing apparatus having a plasma generating unit, a process chamber including an outer cylinder for withstanding a reduced pressure, and an inner cylinder made of non-magnetic material and being replaceable, arranged inside the outer cylinder, a process gas supply unit for supplying gas to the process chamber, a specimen table for holding a specimen and a vacuum pumping unit. A temperature monitoring unit monitors temperature of the inner cylinder, and a controller controls temperature of the outer cylinder. A desired inner cylinder temperature which is inputted in advance in response to a processing condition of the specimen is compared with the monitored temperature of the inner cylinder, and the controller controls the temperature of the outer cylinder in response to a result of the comparison so as to control the inner cylinder temperature to a predetermined value.

摘要翻译： 一种具有等离子体发生单元的等离子体处理装置，包括用于承受减压的外筒的处理室和布置在外筒内的非磁性材料制成的可变更内筒， 气体到处理室，用于保持样品的样品台和真空抽吸单元。 温度监视单元监视内筒的温度，控制器控制外筒的温度。 将根据试样的处理条件预先输入的期望的内筒温度与内筒的监测温度进行比较，并且控制器响应于比较的结果来控制外筒的温度，以便 以将内筒温度控制到预定值。

公开(公告)号：US20060249254A1

公开(公告)日：2006-11-09

申请号：US11478629

申请日：2006-07-03

申请人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

发明人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

IPC分类号： H01L21/306

CPC分类号： H01J37/32504 ,  H01J37/32522 ,  H01J2237/022 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831

摘要： A plasma processing apparatus and method which includes a vacuum processing chamber, a plasma generating unit, a process gas supply unit, a specimen table, and a vacuum pumping unit. The specimen table includes an electrostatic arrangement for holding a specimen on a holding surface of the specimen table by electrostatic force, a specimen table cover arranged around the specimen table, and first and second heat transfer gas supply units. The first heat transfer gas supply unit has a main path for supplying a heat transfer gas to the specimen holding surface for cooling the specimen, and the second heat transfer gas supply unit has a branch path branched from the main path of the first heat transfer gas supply unit for supplying a part of the heat transfer gas to a gap between an outer portion of the specimen holding surface and the specimen table cover.

摘要翻译： 一种等离子体处理装置和方法，其包括真空处理室，等离子体产生单元，处理气体供应单元，样品台和真空泵送单元。 样本台包括用于通过静电力将样本保持在样品台的保持表面上的静电装置，设置在样本台周围的样本台盖以及第一和第二传热气体供应单元。 第一传热气体供给单元具有用于向试样保持面供给传热气体以冷却试样的主路径，第二传热气体供给单元具有从第一传热气体的主路径分支的分支路径 供应单元，用于将一部分传热气体供应到样品保持表面的外部与样品台盖之间的间隙。

公开(公告)号：US20050064717A1

公开(公告)日：2005-03-24

申请号：US10953539

申请日：2004-09-30

申请人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

发明人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

IPC分类号： C30B25/10 ,  C23F4/00 ,  C30B25/16 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/461

CPC分类号： H01J37/32504 ,  H01J37/32522 ,  H01J2237/022 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831

摘要： A plasma processing apparatus having a plasma generating unit, a process chamber including an outer cylinder for withstanding a reduced pressure, and an inner cylinder made of non-magnetic material and being replaceable, arranged inside the outer cylinder, a process gas supply unit for supplying gas to the process chamber, a specimen table for holding a specimen and a vacuum pumping unit. A temperature monitoring unit monitors temperature of the inner cylinder, and a controller controls temperature of the outer cylinder. A desired inner cylinder temperature which is inputted in advance in response to a processing condition of the specimen is compared with the monitored temperature of the inner cylinder, and the controller controls the temperature of the outer cylinder in response to a result of the comparison so as to control the inner cylinder temperature to a predetermined value.

摘要翻译： 一种具有等离子体发生单元的等离子体处理装置，包括用于承受减压的外筒的处理室和布置在外筒内的非磁性材料制成的可变更内筒， 气体到处理室，用于保持样品的样品台和真空抽吸单元。 温度监视单元监视内筒的温度，控制器控制外筒的温度。 将根据试样的处理条件预先输入的期望的内筒温度与内筒的监测温度进行比较，并且控制器响应于比较的结果来控制外筒的温度，以便 以将内筒温度控制到预定值。

公开(公告)号：US20050039683A1

公开(公告)日：2005-02-24

申请号：US10953537

申请日：2004-09-30

申请人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

发明人： Saburo Kanai ,  Kazue Takahashi ,  Kouichi Okamura ,  Ryoji Hamasaki ,  Satoshi Ito

IPC分类号： C30B25/10 ,  C23F4/00 ,  C30B25/16 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/00

CPC分类号： H01J37/32504 ,  H01J37/32522 ,  H01J2237/022 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831

摘要： A plasma processing method utilizing a plasma processing apparatus having a plasma generating unit, a process chamber including an outer cylinder for withstanding a reduced pressure, and an inner cylinder made of non-magnetic material and being replaceable arranged inside the outer cylinder, a process gas supply unit for supplying gas to the process chamber, a specimen table for holding a specimen and a vacuum pumping unit. A temperature of the inner cylinder is monitored, and a desired inner cylinder temperature which is inputted in advance in response to a processing condition of the specimen is compared with the monitored temperature of the inner cylinder. A temperature of the outer cylinder is controlled in response to a result of the comparison so as to control the inner cylinder temperature to a predetermined value.

摘要翻译： 一种利用等离子体处理装置的等离子体处理方法，该等离子体处理装置具有等离子体发生单元，具有用于承受减压的外筒的处理室，以及由非磁性材料制成的可更换的内筒， 用于向处理室供给气体的供给单元，用于保持试样的试样台和真空泵送单元。 监测内筒的温度，并将根据试样的加工条件预先输入的期望的内筒温度与内筒的监测温度进行比较。 响应于比较的结果来控制外筒的温度，以将内筒温度控制到预定值。

公开(公告)号：US09299729B2

公开(公告)日：2016-03-29

申请号：US13430960

申请日：2012-03-27

申请人： Satoshi Ito ,  Yoshitake Tateno

发明人： Satoshi Ito ,  Yoshitake Tateno

IPC分类号： G02F1/1362 ,  H01L27/12 ,  H01L49/02

CPC分类号： H01L27/1255 ,  G02F1/136213 ,  G02F2001/13629 ,  H01L28/60

摘要： An electro-optical device includes a substrate; a translucent pixel electrode installed at one side of the substrate; and a storage capacitor which is installed between the pixel electrode and the substrate, and in which a translucent first electrode layer overlapping with the pixel electrode in a plane view, a translucent second electrode layer electrically connected to the pixel electrode, and a translucent dielectric layer interposed between the first electrode layer and the second electrode layer are laminated.

摘要翻译： 电光装置包括：基板; 安装在基板的一侧的半透明像素电极; 以及存储电容器，其安装在像素电极和基板之间，并且其中在平面图中与像素电极重叠的透光性第一电极层，与像素电极电连接的透光性第二电极层和透光性介电层 插入在第一电极层和第二电极层之间。