Invention Grant
- Patent Title: Method of detecting end point of plasma processing and apparatus for the same
- Patent Title (中): 检测等离子体处理终点的方法及其设备
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Application No.: US962736Application Date: 1997-11-03
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Publication No.: US5928532APublication Date: 1999-07-27
- Inventor: Chishio Koshimizu , Susumu Saito
- Applicant: Chishio Koshimizu , Susumu Saito
- Applicant Address: JPX Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JPX Tokyo
- Priority: JPX8-298697 19961111
- Main IPC: G01N21/68
- IPC: G01N21/68 ; H01J37/32 ; B23K10/00 ; B44C1/22 ; G01N21/00
Abstract:
When processing using a plasma is performed for an object to be processed, a photodetecting unit sequentially detects emission of two active species having specific wavelengths in a designated period during the processing. On the basis of the emission detection information of the two active species, two approximate expressions of linear functions are obtained in the relationship between the emission intensity and time. The ratio of the two approximate expressions of linear functions and the derivative of the ratio are obtained to form a graph in which the ratio is plotted on the abscissa, the derivative of the ratio is plotted on the ordinate, and the intersection between the average value of the ratio and the average value of the derivative of the ratio is the origin. The ratio and the derivative of the ratio are obtained by using the emission detection information of the two active species during the processing after the designated period. The end point of the plasma processing is determined when the position of the ratio and the derivative of the ratio thus obtained deviates from a predetermined region in the graph.
Public/Granted literature
- US5408022A Antimicrobial polymerizable composition, the polymer and article obtained from the same Public/Granted day:1995-04-18
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