发明授权
- 专利标题: Method of producing silicon carbide single crystal
- 专利标题(中): 生产碳化硅单晶的方法
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申请号: US820888申请日: 1997-03-21
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公开(公告)号: US5964944A公开(公告)日: 1999-10-12
- 发明人: Naohiro Sugiyama , Atsuto Okamoto , Toshihiko Tani , Nobuo Kamiya
- 申请人: Naohiro Sugiyama , Atsuto Okamoto , Toshihiko Tani , Nobuo Kamiya
- 申请人地址: JPX Aichi-ken
- 专利权人: Kabushiki Kaisha Toyota Chuo Kenkyusho
- 当前专利权人: Kabushiki Kaisha Toyota Chuo Kenkyusho
- 当前专利权人地址: JPX Aichi-ken
- 优先权: JPX8-103719 19960329
- 主分类号: C30B25/20
- IPC分类号: C30B25/20 ; C30B23/00 ; C30B25/00 ; C30B29/36 ; H01L21/205
摘要:
An easy and low-cost method of producing a large-size and high-purity silicon carbide (SiC) single crystal includes reacting silicon vapor directly with a carbon-containing compound gas under a heated atmosphere (growth space 14) to grow a silicon carbide single crystal (15) on a silicon carbide seed crystal (12), in which the silicon vapor generated from molten silicon (13) is used as a silicon vapor source, and a hydrocarbon gas (9) (e.g., propane gas) is used as the carbon-containing compound gas.
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