发明授权
US5994430A Antireflective coating compositions for photoresist compositions and use
thereof
失效
用于光致抗蚀剂组合物的抗反射涂料组合物及其用途
- 专利标题： Antireflective coating compositions for photoresist compositions and use thereof
- 专利标题（中）： 用于光致抗蚀剂组合物的抗反射涂料组合物及其用途
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申请号： US841750申请日： 1997-04-30
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公开(公告)号： US5994430A公开(公告)日： 1999-11-30
- 发明人: Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
- 申请人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
- 申请人地址： VGX
- 专利权人： Clariant Finance BVI) Limited
- 当前专利权人： Clariant Finance BVI) Limited
- 当前专利权人地址： VGX
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; C08F8/30 ; C08F212/14 ; C08L25/18 ; C09B69/10 ; G03F7/09 ; H01L21/027 ; C08K5/00
摘要：
The present invention relates to an antireflective coating composition comprising a novel polymer in a solvent composition. The invention further comprises processes for using the antireflective coating composition in photolithography. The antireflective coating composition comprises a novel polymer and a solvent composition, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The solvent may be organic, preferrably, a solvent of low toxicity, or it may be water, which may additionally contain other water miscible organic solvents.
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