-
1.发明授权Antireflective coating compositions for photoresist compositions and use thereof 失效用于光致抗蚀剂组合物的抗反射涂料组合物及其用途
公开(公告)号：US5994430A
公开(公告)日：1999-11-30
申请号：US841750
申请日：1997-04-30
申请人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
发明人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
IPC分类号： G03F7/11 , C08F8/30 , C08F212/14 , C08L25/18 , C09B69/10 , G03F7/09 , H01L21/027 , C08K5/00
CPC分类号： C09B69/106 , G03F7/091
摘要： The present invention relates to an antireflective coating composition comprising a novel polymer in a solvent composition. The invention further comprises processes for using the antireflective coating composition in photolithography. The antireflective coating composition comprises a novel polymer and a solvent composition, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The solvent may be organic, preferrably, a solvent of low toxicity, or it may be water, which may additionally contain other water miscible organic solvents.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含溶剂组合物中的新型聚合物。 本发明还包括在光刻中使用抗反射涂料组合物的方法。 抗反射涂料组合物包含新型聚合物和溶剂组合物，其中抗反射涂层的新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元和至少一个不含芳香族官能团的单元。 溶剂可以是有机的，优选地是低毒性的溶剂，或者它可以是水，其可另外含有其它与水可混溶的有机溶剂。
-
公开(公告)号：US5981145A
公开(公告)日：1999-11-09
申请号：US846986
申请日：1997-04-30
申请人： Shuji Ding , Dinesh N. Khanna , Ping-Hung Lu , Jianhui Shan , Ralph R. Dammel , Dana L. Durham , M. Dalil Rahman , Iain McCulloch
发明人： Shuji Ding , Dinesh N. Khanna , Ping-Hung Lu , Jianhui Shan , Ralph R. Dammel , Dana L. Durham , M. Dalil Rahman , Iain McCulloch
IPC分类号： G03F7/11 , C08F8/00 , C08F8/30 , G03F7/09 , H01L21/027
CPC分类号： G03F7/091 , C08F8/00 , C08F8/30 , C08F12/24 , C08F212/14 , C08F2810/20
摘要： The present invention relates to a novel polymer suitable for use as an antireflective coating or as an additive in photoresist for absorption of reflected light. The novel polymer comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The polymer is soluble in organic solvents, preferrably solvents of low toxicity, or it may be soluble in water, which may additionally contain other water miscible organic solvents.
摘要翻译： 本发明涉及一种适合用作抗反射涂层的新型聚合物或作为用于吸收反射光的光刻胶中的添加剂。 该新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元和至少一个不含芳香官能团的单元。 聚合物可溶于有机溶剂中，优选低毒性溶剂，或者它可溶于水，其可另外含有其它与水可混溶的有机溶剂。
-
公开(公告)号：US5733714A
公开(公告)日：1998-03-31
申请号：US724109
申请日：1996-09-30
申请人： Iain McCulloch , Ralph R. Dammel , Anthony J. Corso , Shuji Ding , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna
发明人： Iain McCulloch , Ralph R. Dammel , Anthony J. Corso , Shuji Ding , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna
IPC分类号： G03F7/004 , C08F16/26 , C08F18/04 , C08F20/30 , C08F20/58 , C08F26/06 , G03C1/835 , G03F7/09 , G03F7/11 , H01L21/027 , G03C5/00 , C03F8/30
CPC分类号： G03C1/835 , G03F7/091 , Y10S430/151
摘要： The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
摘要翻译： 本发明涉及一种新颖的抗反射涂层溶液及其在光刻中的应用。 抗反射涂层溶液包括新型聚合物和有机溶剂或有机溶剂的混合物，其中新型聚合物包含含有吸收约180nm至约450nm的染料的单元和含有交联基团的单元。
-
公开(公告)号：US5652297A
公开(公告)日：1997-07-29
申请号：US699001
申请日：1996-08-16
申请人： Iain McCulloch , Ralph R. Dammel , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna , Shuji Ding
发明人： Iain McCulloch , Ralph R. Dammel , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna , Shuji Ding
CPC分类号： G03F7/091 , C08F20/60 , C08F8/30 , C08F2800/10 , C08F2800/20 , C08F2810/20
摘要： The present invention relates to a novel aqueous antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and water, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm, at least one unit containing a crosslinking group and at least one unit derived from a hydrophilic vinyl monomer or a vinyl monomer capable of becoming hydrophilic.
摘要翻译： 本发明涉及一种新颖的水性抗反射涂层溶液及其在光刻中的应用。 抗反射涂层溶液包含新的聚合物和水，其中抗反射涂层的新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元，至少一个含有交联基团和至少一个 衍生自亲水性乙烯基单体或能够变成亲水性的乙烯基单体的单元。
-
5.发明授权Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists 失效原料中的金属离子还原，并使用路易斯碱控制用于阳性光致抗蚀剂中的酚醛清漆树脂的分子量
公开(公告)号：US5476750A
公开(公告)日：1995-12-19
申请号：US999500
申请日：1992-12-29
CPC分类号： C08G8/08 , G03F7/0236
摘要： The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions and a substantially consistent molecular weight. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
摘要翻译： 本发明提供了生产具有非常低水平的金属离子和基本上一致的分子量的水不溶性的碱溶性酚醛清漆树脂的方法。 还提供了用于由这种酚醛清漆树脂制造光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。
-
公开(公告)号：US5876897A
公开(公告)日：1999-03-02
申请号：US812542
申请日：1997-03-07
IPC分类号： C08K5/00 , C08L61/06 , C08L101/12 , G03F7/004 , G03F7/022 , G03F7/039 , H01L21/027 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/022
摘要： A light sensitive positive composition comprising an alkali soluble resin, a novel photoactive compound represented by the structure ##STR1## where, X is O, S or N--R', where R' is H, alkyl, substituted alkyl, aryl or aralkyl,Y is a connecting group such as SO.sub.2, CO, O or NR',Z is a carbon containing organic ballast moiety having a molecular weight greater than about 75 and can form a bond with the connecting group,R is independently H, alkyl, alkoxy, aryl, aralkyl, halo or fluoroalkyl,m=1-3, and n.gtoreq.1;and a solvent or mixture of solvents. The invention further comprises a process for imaging the composition of this invention to give positive image. The light sensitive composition is especially useful as a positive deep-uv photoresist.
摘要翻译： 一种光敏正性组合物，其包含碱溶性树脂，由结构
表示的新型光敏化合物，其中X为O，S或N-R'，其中R'为H，烷基，取代的烷基，芳基或芳烷基， Y是连接基团，例如SO 2，CO，O或NR'，Z是分子量大于约75的含碳有机镇流器部分，可与连接基团形成键，R独立地为H，烷基，烷氧基 ，芳基，芳烷基，卤代或氟烷基，m = 1-3，n≥1; 和溶剂或溶剂混合物。 本发明还包括用于对本发明的组合物进行成像以给出正像的方法。 光敏组合物特别适用于正深紫外光致抗蚀剂。 -
公开(公告)号：US5652317A
公开(公告)日：1997-07-29
申请号：US698742
申请日：1996-08-16
申请人： Iain McCulloch , Ralph R. Dammel , Dana L. Durham , Ping-Hung Lu
发明人： Iain McCulloch , Ralph R. Dammel , Dana L. Durham , Ping-Hung Lu
IPC分类号： G03F7/11 , C08F8/00 , C08F8/30 , C08F20/60 , C08F220/54 , C08L33/26 , C09D133/24 , C09D133/26 , G03F7/09 , G03F7/32 , H01L21/027 , C08F226/00 , G03G13/06
CPC分类号： G03F7/091 , C08F20/60 , C09D133/26
摘要： The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
摘要翻译： 本发明涉及一种新颖的抗反射涂层溶液及其在光刻中的应用。 抗反射涂层溶液包括新型聚合物和有机溶剂或有机溶剂的混合物，其中新型聚合物包含含有吸收约180nm至约450nm的染料的单元和含有交联基团的单元。
-
公开(公告)号：US5763135A
公开(公告)日：1998-06-09
申请号：US722711
申请日：1996-09-30
申请人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Anthony J. Corso
发明人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Anthony J. Corso
IPC分类号： G03F7/004 , C08L5/00 , C08L101/00 , C09B23/00 , C09B29/32 , C09B55/00 , G03F7/039 , G03F7/09 , H01L21/027 , G03F7/023 , G03F7/32
CPC分类号： G03F7/091
摘要： A light-sensitive positive photoresist composition containing a film forming resin, a photoactive compound, a solvent, and an arylhydrazo dye. The dyed photoresist reduces the linewidth variation of the resist pattern on a reflective substrate while giving good lithographic performance.
摘要翻译： 含有成膜树脂，光活性化合物，溶剂和芳基水解染料的光敏正性光致抗蚀剂组合物。 染色的光致抗蚀剂降低了反射基板上的抗蚀剂图案的线宽变化，同时提供了良好的光刻性能。
-
公开(公告)号：US5977288A
公开(公告)日：1999-11-02
申请号：US128900
申请日：1998-08-04
申请人： M. Dalil Rahman , Ping-Hung Lu
发明人： M. Dalil Rahman , Ping-Hung Lu
CPC分类号： C08G8/08 , C08G16/0293 , G03F7/0236
摘要： The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
摘要翻译： 本发明提供一种通过在不进行高温蒸馏的情况下分离这些酚醛清漆树脂部分来制备具有一致的分子量和光致抗蚀剂组合物性能优异的成膜分级酚醛清漆树脂的方法。 还提供了一种从这种分级酚醛清漆树脂制备光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。
-
10.发明授权
公开(公告)号：US5863700A
公开(公告)日：1999-01-26
申请号：US939253
申请日：1997-09-29
申请人： M. Dalil Rahman , Ping-Hung Lu
发明人： M. Dalil Rahman , Ping-Hung Lu
IPC分类号： G03F7/004 , C08G8/00 , C08G8/08 , C08G8/10 , C08G8/20 , C08L61/08 , G03F7/023 , G03F7/039 , G03C5/00
CPC分类号： G03F7/0236 , C08G8/08 , C08G8/10 , C08G8/20
摘要： The present invention provides a method for producing a water insoluble, aqueous alkali soluble novolak resins having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin without high temperature distillation. A method is also provided for producing photoresist composition from such a novolak resin and for producing semiconductor devices using such a photoresist composition.
-
-
-
-
-
-
-
-
-
搜索结果
36 条记录 (耗时 0.038 秒)
