发明授权
US6130147A Methods for forming group III-V arsenide-nitride semiconductor materials
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形成III-V族氮化镓半导体材料的方法
- 专利标题: Methods for forming group III-V arsenide-nitride semiconductor materials
- 专利标题(中): 形成III-V族氮化镓半导体材料的方法
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申请号: US820727申请日: 1997-03-18
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公开(公告)号: US6130147A公开(公告)日: 2000-10-10
- 发明人: Jo S. Major , David F. Welch , Donald R. Scifres
- 申请人: Jo S. Major , David F. Welch , Donald R. Scifres
- 申请人地址: CA San Jose
- 专利权人: SDL, Inc.
- 当前专利权人: SDL, Inc.
- 当前专利权人地址: CA San Jose
- 主分类号: H01L33/32
- IPC分类号: H01L33/32 ; H01S5/323 ; H01L21/28
摘要:
Methods are disclosed for forming Group III--arsenide-nitride semiconductor materials. Group III elements are combined with group V elements, including at least nitrogen and arsenic, in concentrations chosen to lattice match commercially available crystalline substrates. Epitaxial growth of these III-V crystals results in direct bandgap materials, which can be used in applications such as light emitting diodes and lasers. Varying the concentrations of the elements in the III-V crystals varies the bandgaps, such that materials emitting light spanning the visible spectra, as well as mid-IR and near-UV emitters, can be created. Conversely, such material can be used to create devices that acquire light and convert the light to electricity, for applications such as full color photodetectors and solar energy collectors. The growth of the III-V crystals can be accomplished by growing thin layers of elements or compounds in sequences that result in the overall lattice match and bandgap desired.
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