发明授权
US06280523B1 Thickness tailoring of wafer bonded AlxGayInzN structures by laser melting
有权
通过激光熔化对晶片接合AlxGayInzN结构进行厚度裁剪
- 专利标题: Thickness tailoring of wafer bonded AlxGayInzN structures by laser melting
- 专利标题(中): 通过激光熔化对晶片接合AlxGayInzN结构进行厚度裁剪
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申请号: US09245448申请日: 1999-02-05
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公开(公告)号: US06280523B1公开(公告)日: 2001-08-28
- 发明人: Carrie Carter Coman , Fred A. Kish, Jr. , R. Scott Kern , Michael R. Krames , Paul S. Martin
- 申请人: Carrie Carter Coman , Fred A. Kish, Jr. , R. Scott Kern , Michael R. Krames , Paul S. Martin
- 主分类号: C30B2512
- IPC分类号: C30B2512
摘要:
Light emitting devices having a vertical optical path, e.g. a vertical cavity surface emitting laser or a resonant cavity light emitting or detecting device, having high quality mirrors may be achieved using wafer bonding or metallic soldering techniques. The light emitting region interposes one or two reflector stacks containing dielectric distributed Bragg reflectors (DBRs). The dielectric DBRs may be deposited or attached to the light emitting device. A host substrate of GaP, GaAs, InP, or Si is attached to one of the dielectric DBRs. Electrical contacts are added to the light emitting device.
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