发明授权
- 专利标题: Optical system and exposure apparatus provided with the optical system
- 专利标题(中): 设有光学系统的光学系统和曝光装置
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申请号: US10207109申请日: 2002-07-30
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公开(公告)号: US06844915B2公开(公告)日: 2005-01-18
- 发明人: Soichi Owa , Naomasa Shiraishi , Issey Tanaka , Yasuhiro Omura
- 申请人: Soichi Owa , Naomasa Shiraishi , Issey Tanaka , Yasuhiro Omura
- 申请人地址: JP Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge PLC
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03B27/42 ; G02B13/14 ; G02B9/00
摘要:
An optical system attains good optical performance without substantially receiving the effects of birefringence even when using an optical material having intrinsic birefringence. An optical system that includes at least one radiation transmissive member that transmits light having a wavelength of 200 nm or less has an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]. In addition, an optical system can include: a first group of radiation transmissive members that transmits light having a wavelength of 200 nm or less and having an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]; and a second group of radiation transmissive members that transmits light having a wavelength of 200 nm or less and having an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]; wherein the first group of radiation transmissive members and the second group of radiation transmissive members have a positional relationship rotated substantially 45° about the optical axis relative to each other.
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