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1.发明申请Projection optical system and an exposure apparatus with the projection optical system 审中-公开投影光学系统和投影光学系统的曝光装置公开(公告)号：US20050122499A1
公开(公告)日：2005-06-09
申请号：US10982781
申请日：2004-11-08
申请人： Yasuhiro Omura , Naomasa Shiraishi , Issey Tanaka , Soichi Owa , Toshihiko Ozawa , Shunsuke Niisaka
发明人： Yasuhiro Omura , Naomasa Shiraishi , Issey Tanaka , Soichi Owa , Toshihiko Ozawa , Shunsuke Niisaka
CPC分类号： G02B17/0892 , G02B13/24 , G02B17/08 , G03F7/70225 , G03F7/70233 , G03F7/70358 , G03F7/70566 , G03F7/70966
摘要： A projection optical system, which forms a reduced image of a first surface onto a second surface, has excellent optical performance without substantially being affected by birefringence despite the use of optical material having intrinsic birefringence. This is done by suitably arranging certain crystal axes of radiation transmissive members that make up the projection optical system relative to the optical axis of the projection optical system, and by suitably arranging the certain crystal axes of the radiation transmissive members relative to the crystal axes of other radiation transmissive members in the projection optical system.
摘要翻译： 将第一表面的缩小图像形成到第二表面上的投影光学系统虽然使用具有固有双折射的光学材料，但是基本上不受双折射的影响，具有优异的光学性能。 这通过适当地布置构成投影光学系统的相对于投影光学系统的光轴的辐射透射构件的某些晶轴，并且通过将辐射透射构件的某些晶轴相对于晶体轴适当地布置 投影光学系统中的其他辐射透射构件。
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公开(公告)号：US06844915B2
公开(公告)日：2005-01-18
申请号：US10207109
申请日：2002-07-30
申请人： Soichi Owa , Naomasa Shiraishi , Issey Tanaka , Yasuhiro Omura
发明人： Soichi Owa , Naomasa Shiraishi , Issey Tanaka , Yasuhiro Omura
CPC分类号： G03F7/70225 , G03F7/70241 , G03F7/70966
摘要： An optical system attains good optical performance without substantially receiving the effects of birefringence even when using an optical material having intrinsic birefringence. An optical system that includes at least one radiation transmissive member that transmits light having a wavelength of 200 nm or less has an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]. In addition, an optical system can include: a first group of radiation transmissive members that transmits light having a wavelength of 200 nm or less and having an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]; and a second group of radiation transmissive members that transmits light having a wavelength of 200 nm or less and having an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]; wherein the first group of radiation transmissive members and the second group of radiation transmissive members have a positional relationship rotated substantially 45° about the optical axis relative to each other.
摘要翻译： 即使使用具有固有双折射性的光学材料，光学系统也能获得良好的光学性能而基本上不会受到双折射的影响。 包括透射200nm以下的波长的光的至少一个透射性构件的光学系统具有基本上与晶轴[100]重合的光轴或与晶轴[100]相当的晶轴。 此外，光学系统可以包括：透射具有200nm或更小的波长的光并且具有基本上与晶轴[100]重合的光轴的第一组辐射透射构件或者与 晶轴[100]; 以及第二组透射波长为200nm以下并且具有与晶轴[100]大致一致的光轴或与晶轴[100]相当的晶轴的光的辐射透射部件。 其中第一组辐射透射构件和第二组辐射透射构件具有围绕光轴相对于彼此大致45度旋转的位置关系。
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3.发明授权Projection optical system and an exposure apparatus with the projection optical system 失效投影光学系统和投影光学系统的曝光装置公开(公告)号：US06831731B2
公开(公告)日：2004-12-14
申请号：US10183612
申请日：2002-06-28
申请人： Yasuhiro Omura , Naomasa Shiraishi , Issey Tanaka , Soichi Owa , Toshihiko Ozawa , Shunsuke Niisaka
发明人： Yasuhiro Omura , Naomasa Shiraishi , Issey Tanaka , Soichi Owa , Toshihiko Ozawa , Shunsuke Niisaka
IPC分类号： G03B2754
CPC分类号： G02B17/0892 , G02B13/24 , G02B17/08 , G03F7/70225 , G03F7/70233 , G03F7/70358 , G03F7/70566 , G03F7/70966
摘要： A projection optical system, which forms a reduced image of a first surface onto a second surface, has excellent optical performance without substantially being affected by birefringence despite the use of optical material having intrinsic birefringence. This is done by suitably arranging certain crystal axes of radiation transmissive members that make up the projection optical system relative to the optical axis of the projection optical system, and by suitably arranging the certain crystal axes of the radiation transmissive members relative to the crystal axes of other radiation transmissive members in the projection optical system.
摘要翻译： 将第一表面的缩小图像形成到第二表面上的投影光学系统虽然使用具有固有双折射的光学材料，但是基本上不受双折射的影响，具有优异的光学性能。 这通过适当地布置构成投影光学系统的相对于投影光学系统的光轴的辐射透射构件的某些晶轴，并且通过将辐射透射构件的某些晶轴相对于晶体轴适当地布置 投影光学系统中的其他辐射透射构件。
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4.发明授权Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices 失效投影曝光装置及方法，反折射光学系统及装置制造方法公开(公告)号：US07319508B2
公开(公告)日：2008-01-15
申请号：US11878402
申请日：2007-07-24
申请人： Yasuhiro Omura , Naomasa Shiraishi , Soichi Owa
发明人： Yasuhiro Omura , Naomasa Shiraishi , Soichi Owa
CPC分类号： G02B17/0892 , G02B13/24 , G02B17/08 , G03F7/70225 , G03F7/70275 , G03F7/70833
摘要： A catadioptric optical system forms an image of a first surface onto a second surface. The system includes a first lens having a first optical axis, a combination of a concave mirror and a second lens, the combination having a second optical axis, a third lens having a third optical axis, a first reflection plane that is arranged in an optical path between the first lens and the combination, and a second reflection plane that is arranged in an optical path between the combination and the third lens. An intersection line of an extension plane of the first reflection plane and an extension plane of the second reflection plane is set up so that the first optical axis, the second optical axis and the third optical axis intersect at one point. In addition, at least one of the first lens and the third lens is movable.
摘要翻译： 反折射光学系统在第二表面上形成第一表面的图像。 该系统包括具有第一光轴的第一透镜，凹面镜和第二透镜的组合，该组合具有第二光轴，具有第三光轴的第三透镜，配置在光学器件中的第一反射面 第一透镜和组合之间的路径，以及布置在组合和第三透镜之间的光路中的第二反射面。 第一反射面的延伸面和第二反射面的延伸面的交线被设定为使得第一光轴，第二光轴和第三光轴在一点相交。 此外，第一透镜和第三透镜中的至少一个是可移动的。
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5.发明申请Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices 失效投影曝光装置及方法，反折射光学系统及装置制造方法公开(公告)号：US20070268474A1
公开(公告)日：2007-11-22
申请号：US11878402
申请日：2007-07-24
申请人： Yasuhiro Omura , Naomasa Shiraishi , Soichi Owa
发明人： Yasuhiro Omura , Naomasa Shiraishi , Soichi Owa
IPC分类号： G03B27/54
CPC分类号： G02B17/0892 , G02B13/24 , G02B17/08 , G03F7/70225 , G03F7/70275 , G03F7/70833
摘要： A catadioptric optical system forms an image of a first surface onto a second surface. The system includes a first lens having a first optical axis, a combination of a concave mirror and a second lens, the combination having a second optical axis, a third lens having a third optical axis, a first reflection plane that is arranged in an optical path between the first lens and the combination, and a second reflection plane that is arranged in an optical path between the combination and the third lens. An intersection line of an extension plane of the first reflection plane and an extension plane of the second reflection plane is set up so that the first optical axis, the second optical axis and the third optical axis intersect at one point. In addition, at least one of the first lens and the third lens is movable.
摘要翻译： 反折射光学系统在第二表面上形成第一表面的图像。 该系统包括具有第一光轴的第一透镜，凹面镜和第二透镜的组合，所述组合具有第二光轴，具有第三光轴的第三透镜，配置在光学器件中的第一反射面 第一透镜和组合之间的路径，以及布置在组合和第三透镜之间的光路中的第二反射面。 第一反射面的延伸面和第二反射面的延伸面的交线被设定为使得第一光轴，第二光轴和第三光轴在一点相交。 此外，第一透镜和第三透镜中的至少一个是可移动的。
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6.发明授权Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices 有权投影曝光装置及方法，反折射光学系统及装置制造方法公开(公告)号：US07301605B2
公开(公告)日：2007-11-27
申请号：US09769832
申请日：2001-01-26
申请人： Yasuhiro Omura , Naomasa Shiraishi , Soichi Owa
发明人： Yasuhiro Omura , Naomasa Shiraishi , Soichi Owa
CPC分类号： G02B17/0892 , G02B13/24 , G02B17/08 , G03F7/70225 , G03F7/70275 , G03F7/70833
摘要： A projection exposure apparatus includes a projection optical system, which is arranged in an optical path between a first surface and a second surface, projects a pattern on a negative plate arranged on the first surface onto a workpiece arranged on the second surface and exposes the pattern thereon. The projection optical system includes a first imaging optical subsystem having a dioptric imaging optical system; a second imaging optical subsystem having a concave reflecting system; a third imaging optical subsystem having a dioptric imaging optical system; a first folding mirror arranged in an optical path between the first imaging optical subsystem and the second imaging optical subsystem; and a second folding mirror arranged in an optical path between the second imaging optical subsystem and the third imaging optical subsystem. The first imaging optical subsystem forms a first intermediate image and the second imaging optical subsystem forms a second intermediate image.
摘要翻译： 投影曝光装置包括投影光学系统，该投影光学系统布置在第一表面和第二表面之间的光路中，将布置在第一表面上的负极板上的图案投影到布置在第二表面上的工件上， 上。 投影光学系统包括具有屈光成像光学系统的第一成像光学子系统; 具有凹面反射系统的第二成像光学子系统; 具有屈光成像光学系统的第三成像光学子系统; 布置在第一成像光学子系统和第二成像光学子系统之间的光路中的第一折叠镜; 以及布置在第二成像光学子系统和第三成像光学子系统之间的光路中的第二折叠镜。 第一成像光学子系统形成第一中间图像，第二成像光学子系统形成第二中间图像。
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公开(公告)号：US08208119B2
公开(公告)日：2012-06-26
申请号：US10588297
申请日：2005-02-03
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/7075 , G03F7/70891
摘要： An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ).
摘要翻译： 曝光装置（EX）通过液体（LQ）在基板（P）上照射曝光光（EL）而曝光基板（P）。 曝光装置（EX）具有用于保持基板（P）的基板保持器（PH），能够移动由基板保持件（PH）保持的基板（P）的基板台（PST）和温度调节系统 60），用于调节衬底保持器（PH）的温度。 控制基板（P）的温度，使得基板（P）和液体（LQ）之间的温度没有差异，从而防止由液体（LQ）的温度变化引起的曝光精度的降低。
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公开(公告)号：US20080106707A1
公开(公告)日：2008-05-08
申请号：US10588297
申请日：2005-02-03
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/7075 , G03F7/70891
摘要： An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ).
摘要翻译： 曝光装置（EX）通过液体（LQ）在基板（P）上照射曝光光（EL）而曝光基板（P）。 曝光装置（EX）具有用于保持基板（P）的基板保持器（PH），能够移动由基板保持件（PH）保持的基板（P）的基板台（PST）和温度调节系统 60），用于调节衬底保持器（PH）的温度。 控制基板（P）的温度，使得基板（P）和液体（LQ）之间的温度没有差异，从而防止由液体（LQ）的温度变化引起的曝光精度的降低。
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公开(公告)号：US08102508B2
公开(公告)日：2012-01-24
申请号：US11658918
申请日：2005-07-22
申请人： Yasuhiro Omura , Soichi Owa
发明人： Yasuhiro Omura , Soichi Owa
IPC分类号： G03B27/52
CPC分类号： G03F7/70958 , G02B17/0892 , G03F7/70225 , G03F7/70341
摘要： An imaging optical system that has liquid interposed in an optical path to the image plane to achieve a large effective image-side numerical aperture larger than, for example, 1.4, while a relatively large effective imaging region can be achieved. The imaging optical system that projects an image of a first surface onto a second surface. The optical path between the projection optical system and the second surface can be filled with liquid with a refractive index larger than 1.5, where a refractive index of gas in an optical path within the imaging optical system is 1. The imaging optical system comprises a boundary lens that can be contacted with the gas on the side of the first surface and that can be contacted with the liquid on the side of the second surface, and the boundary lens has a positive refracting power and is made of an optical material having a refractive index larger than 1.8.
摘要翻译： 一种成像光学系统，其具有插入到图像平面的光路中的液体，以实现大于例如1.4的大的有效图像侧数值孔径，同时可以实现相对大的有效成像区域。 成像光学系统，其将第一表面的图像投影到第二表面上。 投影光学系统和第二表面之间的光路可以用折射率大于1.5的液体填充，其中成像光学系统内的光路中的气体的折射率为1.成像光学系统包括边界 透镜，其可以与第一表面侧的气体接触并且可以与第二表面侧的液体接触，并且边界透镜具有正折射率，并且由具有折射率的光学材料制成 指数大于1.8。
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公开(公告)号：US08605252B2
公开(公告)日：2013-12-10
申请号：US13473438
申请日：2012-05-16
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/7075 , G03F7/70891
摘要： An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.
摘要翻译： 曝光装置通过液体将基板上的曝光光照射而曝光基板。 曝光装置具有用于保持基板的基板保持件，能够移动由基板保持件保持的基板的基板台和用于调整基板保持器的温度的温度调节系统。 控制基板的温度，使得基板和液体之间的温度没有差异，从而防止由液体温度变化引起的曝光精度的降低。
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